MgB2 Superconducting Films Fabricated on Copper Substrate by Hybrid Physical-Chemical Vapor Deposition

Fen Li; Tao Guo; Kai Cheng Zhang; Chin Ping Chen; Qing Rong Feng

doi:10.4028/www.scientific.net/MSF.546-549.1919

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HomeMaterials Science ForumMaterials Science Forum Vols. 546-549MgB2 Superconducting Films Fabricated on Copper...

MgB₂ Superconducting Films Fabricated on Copper Substrate by Hybrid Physical-Chemical Vapor Deposition

Abstract:

The thick MgB2 films have been successfully grown on the Cu substrate by the technique of hybrid physical-chemical vapor deposition (HPCVD). The films are about 2 ~ 3 μm and quite dense. They possess the Tc (onset), as high as 37-38 K, and sharp transition ~ 0.8 K. X-ray diffraction (XRD) indicates their polycrystalline character. The upper critical field at T=0K, HC2(0), is extrapolated as 15.3T. The controlled growth of MgB2 film on Cu substrate opens a new route in the preparation of MgB2 tape materials.

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Materials Science Forum (Volumes 546-549)

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1919-1922

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https://doi.org/10.4028/www.scientific.net/MSF.546-549.1919

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Online since:

May 2007

Authors:

Fen Li, Tao Guo, Kai Cheng Zhang, Chin Ping Chen, Qing Rong Feng

Keywords:

Cu Substrates, HPCVD, MgB₂ Thick Films

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