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Surface Roughness Control of Zirconia Films Using a Novel Photoresponsive Precursor Molecule for Improving its Photocatalytic Activity

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Abstract:

A novel photoresponsive zirconia (ZrO2) precursor solution was prepared using zirconium tetra-n-butoxide, 4-(phenylazo)benzoic acid and ethyleneglycol monomethylether. Two kinds of ZrO2 films were prepared using the photoresponsive ZrO2 precursor solution and by dip-coating while applying an electric field to the substrates: one was the film prepared with ultraviolet (UV) irradiation to the solution and as-deposited films; the other was the film prepared without UV irradiation. It was found that the surface roughness of films was greatly changed by UV irradiation. Furthermore, the photocatalytic activity of the rough film was greater than that of the smooth film.

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Periodical:

Materials Science Forum (Volume 569)

Pages:

13-16

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.569.13

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Online since:

January 2008

Authors:

Kaori Nishizawa, Takeshi Miki, Eiji Watanabe, Hiroshi Taoda

Keywords:

Electric Field, Photocatalytic, Photoresponsive Precursor, Surface Roughness (SR), ZrO2 Films

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© 2008 Trans Tech Publications Ltd. All Rights Reserved

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