Study of the Defect Formation of Helium in Nanocrystalline Titanium Films

J.J. Long; Ai Hong Deng; Y.L. Zhou; Q. Hou; X.X. Yu; J. Yu; X. Cheng; Y.J. Zhang; L.Q. Shi

doi:10.4028/www.scientific.net/MSF.607.192

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Study of the Defect Formation of Helium in Nanocrystalline Titanium Films
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HomeMaterials Science ForumMaterials Science Forum Vol. 607Study of the Defect Formation of Helium in...

Study of the Defect Formation of Helium in Nanocrystalline Titanium Films

Abstract:

In this paper, helium-charged nanocrystalline Ti films with different bias voltages were deposited by the He-Ar magnetron co-sputtering method. XRD was used to investigate the microstructure of the He-Ti film. Meanwhile, in order to find out the factors of affecting the growth and size of helium clusters, kinetic Monte Carlo (KMC) simulation was carried out to study the growth of helium cluster, based on the simulation of helium behavior in titanium using molecular dynamics.