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Effect of Various CF4/CH4 Flow Ratios on Structure and Optical Band Gap of Fluorinated Diamond-Like Carbon Thin Films

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Abstract:

Fluorinated diamond-like carbon (F-DLC) thin films are deposited using radio frequency plasma enhanced chemical vapor deposition under various gas flow ratios. The surface morphology of the F-DLC thin films deposited at lower gas flow ratios is a compact and uniform structure, and it became rough with the increase of gas flow ratios. The relative atomic contents of fluorine and chemical bonding configurations of C-Fx (x=1, 2, 3) in the thin films increases with the increase of gas flow ratios. The optical band gap of the thin films presents a decrease of different degree with the increase of gas flow ratios.

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Periodical:

Materials Science Forum (Volumes 663-665)

Pages:

312-315

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.663-665.312

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Online since:

November 2010

Authors:

Jian Rong Xiao, Tao Tong, Yan Wei Li, Xin Hai Li

Keywords:

F-DLC Thin Film, Gas Flow Ratio, Microstructure, Optical Band Gap

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© 2011 Trans Tech Publications Ltd. All Rights Reserved

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