A Simple Texturization Approach for Mono-Crystalline Silicon Solar Cell with Low TMAH Concentration Solution

Wei Ying Ou; Yao Zhang; Hai Ling Li; Lei Zhao; Chun Lan Zhou; Hong Wei Diao; Min Liu; Wei Ming Lu; Jun Zhang; Wen Jing Wang

doi:10.4028/www.scientific.net/MSF.685.26

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HomeMaterials Science ForumMaterials Science Forum Vol. 685A Simple Texturization Approach for...

A Simple Texturization Approach for Mono-Crystalline Silicon Solar Cell with Low TMAH Concentration Solution

Abstract:

Texturing for mono-crystalline silicon solar cell by chemical anisotropic etching is one of the most important techniques in photovoltaic industry. In recent years, tetramethylammonium hydroxide (TMAH) solution or a mixture of TMAH solution with IPA was reported to be used for random pyramids texturization on silicon surface due to its non-volatile, nontoxic, good anisotropic etching characteristics and uncontaminated metal ions. However, most of the studies were reported about the etching processes by using high TMAH concentration solutions. In this study, a simple and cost-effective approach for texturing mono-crystalline silicon wafers in low TMAH concentration solutions was proposed. Etching was performed on (100) silicon wafers using silicon-dissolved tetramethylammonium hydroxide (TMAH) solutions (0.5~1 %) without addition of surfactant. The surface phenomena, surface morphology and surface reflectance have been analyzed. A textured surface with smaller and smooth pyramids can be realized by using 1 % silicon-dissolved TMAH solutions.

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Periodical:

Materials Science Forum (Volume 685)

Pages:

26-30

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.685.26

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Online since:

June 2011

Authors:

Wei Ying Ou, Yao Zhang, Hai Ling Li, Lei Zhao, Chun Lan Zhou, Hong Wei Diao, Min Liu, Wei Ming Lu, Jun Zhang, Wen Jing Wang

Keywords:

Pyramid, Texture, TMAH

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