Microstructure and Properties of TiAlN Compound Films Fabricated on AZ91D Alloy by Magnetron Sputtering

Abstract:

By means of reaction magnetron sputtering, TiAlN ternary compound films were deposited on AZ91D magnesium alloy substrates. The influence of partial pressure ratio of N₂ to Ar (N₂/Ar) on the microstructure and properties of TiAlN film was explored with scanning electron microscopy (SEM), X-ray diffraction (XRD), and tests of microhardness, hydrophile and corrosion resistance. The results show that with the increase of N₂/Ar partial pressure ratio from 0.5:10 to 1.5:10, Ti₂N becomes the main film phase and the size of the crystals cluster decreases. As the N₂/Ar ratio is as higher as 2:10, the film crystals change from Ti₂N to TiN with coarse clusters. With increase of N₂/Ar rate, the hardness, hydrophobic nature and corrosion resistance of the TiAlN film tend to increase.

• Periodical: Materials Science Forum (Volume 686)
• Pages: 589-594
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.686.589
• Online since: June 2011
• Authors: Sheng Lu, Liang Wen Wu, Jing Chen
• Keywords: Corrosion, Magnesium Alloy, Magnetron Sputtering, TiAlN Film

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