Effect of Sample Mount on Active Screen Plasma Duplex Processing

Abstract:

Nitriding steel sample SACM 645 was nitrided by active screen plasma nitriding using a titanium double screen to form simultaneously TiN coatings/nitrogen-diffusion layer on the sample surface. The sample was placed on the sample mount of the various materials (SACM 645, Cu, Ti and SiO₂-Al₂O₃). The sample with the mount was placed on the sample stage in a cathodic potential. A titanium double screen was placed on the cathodic stage around the mount. Active screen plasma duplex processing were performed in 75% N₂ + 25% H₂ atmosphere for 18 ks at 823 K under 100 Pa. In each sample, the hardness of the sample surface was high and beneath compound layer, the hardness decreased rapidly with the distance from the surface, following a flattening of the profile. Wear loss of each duplex-processed sample decreased than that of untreated sample. Particularly, wear loss of the sample using the Ti mount considerably decreased.

• Periodical: Materials Science Forum (Volume 782)
• Pages: 16-22
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.782.16
• Online since: April 2014
• Authors: Akio Nishimoto, Kunishige Nakazawa
• Keywords: Active Screen Plasma Nitriding, Duplex Processing, Nitriding Steel, Plasma Nitriding, Surface Engineering, Titanium Nitride Coating

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