Substrate Temperature and La_0.9Sr_0.1Ga_0.8Mg_0.2O_3-δ Electrolyte Film Growth by Radio Frequency Magnetron Sputtering

Abstract:

La_0.9Sr_0.1Ga_0.8Mg_0.2O_3-δ (LSGM) electrolyte thin films were fabricated on La_0.7Sr_0.3Cr_0.5Mn_0.5O_2.75 (LSCM) porous anode substrates by Radio Frequency (RF) magnetron sputtering method. The compatibility between LSGM and LSCM was examined. Microstructures of LSGM thin films fabricated were observed by scanning electron microscope (SEM). The effect of substrate temperature on LSGM thin films was clarified by X-ray Diffraction (XRD). Deposition rate increases firstly at the range of 50°C~150°C, and then decreases at the range of 150°C ~300°C. After annealing, perovskite structure with the same growth orientation forms at different substrate temperature. Crystallite size decreases at first, to the minimum point at 150°C, then increases as substrate temperature rises.

• Periodical: Materials Science Forum (Volume 833)
• Pages: 127-133
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.833.127
• Online since: November 2015
• Authors: Jie Yu, Jie Xing, Xiu Hua Chen, Wen Hui Ma, Rui Li, Jian Jun Yang
• Keywords: Electrolyte Film, La_0.9Sr_0.1Ga_0.8Mg_0.2O_3-δ (LSGM), Radio Frequency (RF) Magnetron Sputtering, Substrate Temperature

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