Structure and Properties of W-Ti Thin Films Deposited by Magnetron Sputtering

Abstract:

W-Ti thin films with different Ti contents were prepared by dc magnetron sputtering on silicon substrates of p-type (100) orientation, and the pure W and pure Ti thin films with the same thick were also prepared for comparison. The microstructure and properties of W-Ti thin film were characterized by XRD, SEM, AFM, microhardness tester and four-point probe method. The results show that the thin films exhibited a polycrystalline structure in the form of columnar grains, and only b.c.c. W phase could be registered in the films, and with the increase of Ti content, the solid solution of W-Ti was found. Compared to pure W film, the microhardness of W-Ti films decreased with the increasing of Ti content, while the sheet resistance rises with the increasing of Ti content. The microhardness of W-Ti thin films was higher than pure Ti thin films, and the sheet resistance was lower than pure Ti thin films.

• Periodical: Materials Science Forum (Volume 849)
• Pages: 654-658
• DOI: https://doi.org/10.4028/www.scientific.net/MSF.849.654
• Online since: March 2016
• Authors: Guo Qi Sun, Sun Yong*, Yong Hua Duan
• Keywords: Magnetron Co-Sputtering, Microhardness, Sheet Resistance, W-Ti Thin Films

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