HVEM In Situ Investigation of Stress-Induced Grain Growth during Thermal Annealing of Thin Al-Alloy Films on a Si/SiO2 Substrate

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Periodical:

Materials Science Forum (Volumes 94-96)

Edited by:

G. Abbruzzese and P. Brozzo

Pages:

551-556

DOI:

10.4028/www.scientific.net/MSF.94-96.551

Citation:

D. Katzer et al., "HVEM In Situ Investigation of Stress-Induced Grain Growth during Thermal Annealing of Thin Al-Alloy Films on a Si/SiO2 Substrate ", Materials Science Forum, Vols. 94-96, pp. 551-556, 1992

Online since:

January 1992

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$35.00

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