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Thermochromic Properties of Vanadium Oxide Films Prepared by R-HIPIMS Using Closed-Loop Controlled with Plasma Emission Monitoring

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Abstract:

The vanadium dioxide films were deposited by reactive high-power impulse magnetron sputtering for different plasma emission intensity at the substrate temperature of 310 °C. The setpoint of plasma emission intensity was controlled by a PID controller with plasma-emission-monitoring. The vanadium dioxide films characteristics were measured by optical spectrophotometer, X-ray diffraction and electrical source meter.

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Periodical:

Materials Science Forum (Volume 940)

Pages:

114-119

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.940.114

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Online since:

December 2018

Authors:

Chien Jen Tang*, Wei Hsuan Hsu, Ching Tang Li

Keywords:

Plasma Emission Monitoring (PEM), Proportional–Integral–Derivative (PID) Controller, Reactive High-Power Impulse Magnetron Sputtering (R-HIPIMS), Thermochromic Properties, Vanadium Oxide

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© 2018 Trans Tech Publications Ltd. All Rights Reserved

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