POSS-Containing Nanocomposite Materials for Next Generation Nanolithography

Jae Hak Choi; Phil Hyun Kang; Young Chang Nho; Sung Kwon Hong

doi:10.4028/www.scientific.net/SSP.119.299

Paper Titles

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Synthesis of Dimethyl Carbonate from Methanol and Carbon Dioxide by Heteropolyacid/Metal Oxide Catalysts
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Mesoporous Nitrides through Nano-Hard Templating Techniques
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Preparation and Characterization of Polypyrrole-Coated Silicon Nanoparticles
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POSS-Containing Nanocomposite Materials for Next Generation Nanolithography
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Preparation and Cu(II) Complexation Characteristics of Carboxymethylated Polyethyleneimine (CM-PEI) / Microporous Activated Carbon Composite
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Effect of Solvents on the Dispersion Stability of Alloy 625 Nanoparticles
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Grain Refinement of 6061 Al Alloy by the Modified Strain-Induced Melt- Activated(SIMA) Process for Semi-Solid Processing
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Five Strip-Type Dye Sensitized Solar Cells with Metal Grid Lines
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HomeSolid State PhenomenaSolid State Phenomena Vol. 119POSS-Containing Nanocomposite Materials for Next...

POSS-Containing Nanocomposite Materials for Next Generation Nanolithography

Abstract:

Nanocomposite materials based on poly(p-hydroxystyrene-co-2-methyl-2-adamantyl methacrylate-co-methacrylisobutyl-POSS) were synthesized and evaluated as EUV chemically amplified resists. Incorporation of 2-methyl-2-adamantyl and POSS groups into the matrix polymer made it possible to improve the dry-etch resistance, and excellent lithographic performance was obtained. The well-defined 250 nm positive patterns were obtained using a KrF excimer laser scanner, and 100 nm elbow patterns using an EUV lithography tool. The dry-etch resistance of this resist for a CF4-based plasma was comparable to that of poly(p-hydroxystyrene).

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Nanocomposites and Nanoporous Materials VII

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Periodical:

Solid State Phenomena (Volume 119)

Pages:

299-302

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.119.299

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Online since:

January 2007

Authors:

Jae Hak Choi, Phil Hyun Kang, Young Chang Nho, Sung Kwon Hong

Keywords:

EUV Lithography, Nanocomposite, Polyhedral Oligomeric Silsesquioxane (POSS), Resist

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