Synthesis and Intrinsic Stress of Ti-Containing Carbon Nitride Nanocomposite Films

P. Xu; J.J. Li; Chang Zhi Gu

doi:10.4028/www.scientific.net/SSP.121-123.917

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Synthesis and Intrinsic Stress of Ti-Containing Carbon Nitride Nanocomposite Films

Abstract:

Titanium containing carbon nitride (CNx) films are prepared by radio frequency magnetron sputtering method. The evolution of intrinsic stress within the nanocomposite films is monitored during growth by using an in situ bending-plate method. The effect of Ti-containing concentration on intrinsic stress is investigated. XRD data shows that TiN nanocrystals are synthesized to embed into the CNx matrix. The film intrinsic stress depends obviously on the content of Ti. We suggest that grain boundary effect is responsible to the intrinsic stress variation as a function of the content of Ti.