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Ti Oxide Films Formed by an Anodizing Process for Use in Dental Implants
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Ti Oxide Films Formed by an Anodizing Process for Use in Dental Implants

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Abstract:

Anodic oxide films were formed on titanium using an electrolyte solution containing phosphoric acid for dental implants by an electrochemical method. The parameters of the oxidation process were current density and electrolyte concentration. The micro structural morphology, surface roughness, thickness of the oxide layer and the behavior of voltage-time curves were examined. The results show that the surface roughness, porosity size and the thickness of the oxide layer showed similar trends as the process parameters were changed. The surface morphology of the samples was observed for different current densities at a constant electrolyte concentration. The pore size, thickness and roughness of the anodic oxide films are directly proportional to the maximum voltage and the slope of the voltage to time transient (dV/dt) curves during the growth of the galvanostatic anode oxide film on plate type Ti.

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Periodical:

Solid State Phenomena (Volumes 124-126)

Pages:

1777-1780

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.124-126.1777

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Online since:

June 2007

Authors:

Ji Eon Lee, Kye Sung Kim, Young Rae Cho, Kwang Ho Kim, Won Sub Chung

Keywords:

Anodic Oxide Films, Anodization, Implant, Roughness, Titanium (Ti)

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© 2007 Trans Tech Publications Ltd. All Rights Reserved

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