Ti Oxide Films Formed by an Anodizing Process for Use in Dental Implants
Anodic oxide films were formed on titanium using an electrolyte solution containing phosphoric acid for dental implants by an electrochemical method. The parameters of the oxidation process were current density and electrolyte concentration. The micro structural morphology, surface roughness, thickness of the oxide layer and the behavior of voltage-time curves were examined. The results show that the surface roughness, porosity size and the thickness of the oxide layer showed similar trends as the process parameters were changed. The surface morphology of the samples was observed for different current densities at a constant electrolyte concentration. The pore size, thickness and roughness of the anodic oxide films are directly proportional to the maximum voltage and the slope of the voltage to time transient (dV/dt) curves during the growth of the galvanostatic anode oxide film on plate type Ti.
Byung Tae Ahn, Hyeongtag Jeon, Bo Young Hur, Kibae Kim and Jong Wan Park
J. E. Lee et al., "Ti Oxide Films Formed by an Anodizing Process for Use in Dental Implants", Solid State Phenomena, Vols. 124-126, pp. 1777-1780, 2007