Crystallographic and Magnetic Properties of Sm2Fe17N3 Films Grown by RF Magnetron Sputtering

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Sm2Fe17Nx film magnets were prepared using a Sm2Fe17 target in a N2 gas atmosphere using a RF magnetron sputtering technique. The effect of nitrogenation treatment such as N2 gas pressure during sputtering, film heating temperature, N2 gas rate, and the effect of film thickness on the microstructure and magnetic properties of Sm2Fe17Nx films were studied. Optimized magnetic properties with film thickness 270Å, N2 gas rate 10 % and heating temperature 530°C could be obtained. In-plane anisotropy, which was the basic goal in this study, was achieved by controlling the nitrogenation parameters.

Info:

Periodical:

Solid State Phenomena (Volumes 124-126)

Edited by:

Byung Tae Ahn, Hyeongtag Jeon, Bo Young Hur, Kibae Kim and Jong Wan Park

Pages:

859-862

DOI:

10.4028/www.scientific.net/SSP.124-126.859

Citation:

E. C. Kim "Crystallographic and Magnetic Properties of Sm2Fe17N3 Films Grown by RF Magnetron Sputtering", Solid State Phenomena, Vols. 124-126, pp. 859-862, 2007

Online since:

June 2007

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$35.00

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