Reflectometry Studies of Mesoporous Silica Thin Films

Young Kyu Hwang; Ajit Singh Mamman; K. R. Patil; Lee Kyung Kim; Jin Soo Hwang; Jong San Chang

doi:10.4028/www.scientific.net/SSP.135.31

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HomeSolid State PhenomenaSolid State Phenomena Vol. 135Reflectometry Studies of Mesoporous Silica Thin...

Reflectometry Studies of Mesoporous Silica Thin Films

Abstract:

Reflectometry technique has been successfully applied to investigate the correlation between the porosity and optical property (refractive index) of the ordered mesoporous thin film deposited on silicon wafer substrates. The measured optical spectra were simulated by the Effective Medium approximation model. The reflectometry technique has been found to be appropriate for the measurement of thickness of thin films as well as thick layer films. The mesoporous silica films prepared from tri-block copolymer (F-127) as a surfactant and polypropylene oxide as a swelling agent were subsequently exposed to the ammonia vapors to enhance thermal stability and shrinkage minimization of the film that results in increased film thickness.

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Nanocomposites and Nanoporous Materials VIII

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Solid State Phenomena (Volume 135)

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31-34

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https://doi.org/10.4028/www.scientific.net/SSP.135.31

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Online since:

February 2008

Authors:

Young Kyu Hwang, Ajit Singh Mamman, K. R. Patil, Lee Kyung Kim, Jin Soo Hwang, Jong San Chang

Keywords:

Mesoporus Silica Film, Porosity, Reflectometry, Spectroscopic Ellipsometry (SE), Thickness

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