Microstructural Property of Silicon Thin Films Deposited on Nanodiamonds Related to QALD Growth Condition

Jing Lu; Yan Hui Wang

doi:10.4028/www.scientific.net/SSP.175.226

Paper Titles

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CVD Diamond Films as Wear-Resistant Coatings for Relief Valve Components in the Coal Liquefaction Equipment
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Microstructural Property of Silicon Thin Films Deposited on Nanodiamonds Related to QALD Growth Condition
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Study on Fabrication and Cutting Performance of CVD Diamond Coated Drills in Machining the Carbon Fiber Reinforced Plastics
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HomeSolid State PhenomenaSolid State Phenomena Vol. 175Microstructural Property of Silicon Thin Films...

Microstructural Property of Silicon Thin Films Deposited on Nanodiamonds Related to QALD Growth Condition

Abstract:

Quasi atomic layer deposition method has been successfully used to coat detonation nanodiamonds with ultrathin silicon film from decomposition of gaseous monosilane. Transmission electron microscopy observation indicates a continuous silicon coating could be obtained on every individual particle of nanodiamonds. The changes in the microstructural property of silicon thin films deposited at the temperatures of 400, 450, 500, 550, and 600 °C have been characterized by Raman spectroscopy, X-ray diffraction and Energy dispersive spectroscopy techniques. The results show the phase transition of as-deposited silicon from a crystalline to an amorphous then to a crystalline phase with the temperature increase.

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Periodical:

Solid State Phenomena (Volume 175)

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226-230

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.175.226

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Online since:

June 2011

Authors:

Jing Lu, Yan Hui Wang

Keywords:

Microstructural Property, Nanodiamond, Silicon Film

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