Diamond Films Synthesis with a DC Arc Plasma Jet: Effect of Substrate Temperature on Quality of Diamond Films

Article Preview

Abstract:

. High quality diamond film wafers with different thickness are prepared by high power DC arc plasma jet CVD (DCPJ CVD) method using a CH4/Ar/H2 gas mixture. The effect of substrate temperature on the quality of diamond film was studied with theoretical analysis and experimental investigation. The results indicate that different structures in diamond film may grow with different substrate temperatures. The temperatures of 800°C, 900°C and 1000°C were tested in the experiments. The quality of diamond film showed the best at the temperature of 900°C. Characterization by X-ray diffraction, Raman spectroscopy and SEM analysis are also carried out.

You might also be interested in these eBooks

Info:

Periodical:

Solid State Phenomena (Volume 175)

Pages:

245-248

Citation:

Online since:

June 2011

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2011 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] S.W. Reeve and et al: Thin Solid Films Vol. 236(1) (1993), pp: 91-95.

Google Scholar

[2] D. Friedericke and et al: Surf. and Coat. Tech. Vol. 119(5) (1999), pp: 428-439.

Google Scholar

[3] F. X. Lu and et al: Diam. Relat. Mater. Vol. 7(6) (1998), pp: 737-741.

Google Scholar

[4] F. X. Lu and et al: Diam. Relat. Mater. Vol. 10(9) (2001), pp: 1551-1558.

Google Scholar

[5] R.F. Chen and et al: J. Aeronautical Mater. Vol. 26(1) (2006), pp: 20-24.

Google Scholar

[6] R.F. Chen, D.W. Zuo, D.S. Li, et al.: J. of Mate. Sci. & Tech. Vol. 23 (4) (2007), pp: 495-498.

Google Scholar

[7] G.F. Zhong and et al.: J. of Univ. of Sci. and Tech. Beijing Vol. 21(4) (1999), pp: 353-356.

Google Scholar

[8] R.F. Chen and et al.: Acta Metall. Sin. Vol. 41(10) (2005), pp: 1091-1095.

Google Scholar