Study on the Properties of ZnO-TFT Prepared by Magnetron Sputtering

Hao Liang

doi:10.4028/www.scientific.net/SSP.278.48

Paper Titles

Post Processing of Roughness Raw Data
p.15

Machinability Assessment of Soda Lime Glass in Ultrasonic-Assisted Drilling
p.23

Overlap Ratio in Wire- and Powder-Based Laser Metal Deposition of H11 + Nb for Hot Forging Dies
p.28

Forming Mechanism and Bonding Properties of Fe-Si-B Amorphous Strip/Al Foil Laminate Composites by Ultrasonic Addictive Manufacturing (UAM)
p.39

Study on the Properties of ZnO-TFT Prepared by Magnetron Sputtering
p.48

Development of Hybrid Composite Material of Palm Kernel Shell (PKS) and Periwinkle Shell (PS) Particles in Pure Aluminium Matrix
p.54

Research of the Surface Treatment Process of Bonded NdFeB Magnet with Composite Powder Electrostatic Spraying
p.63

Peculiarities of Medium Carbon Steel Wire Microstructure Formation after Different Kinds of Deformational Processing
p.72

Optimal Manufacture Formulas for Waste Tire after Pyrolysis and Lightweight Composites after its Combustion Utilization in Sequence through Statically Analyses
p.78

HomeSolid State PhenomenaSolid State Phenomena Vol. 278Study on the Properties of ZnO-TFT Prepared by...

Study on the Properties of ZnO-TFT Prepared by Magnetron Sputtering

Abstract:

ZnO thin films have been paid more attention by the scientific community because of their long wavelength and high temperature resistance, and the method of preparing ZnO-TFT by magnetron sputtering is one of the most widely recognized technologies. In this paper, the influence factors, such as sputtering power, sputtering oxygen argon ratio and sputtering temperature, are introduced. In this paper, the ZnO thin film substrate materials are analyzed, and the corresponding conclusions are obtained.

You might also be interested in these eBooks

Manufacturing Engineering and Process VII

View Preview

Info:

Periodical:

Solid State Phenomena (Volume 278)

Pages:

48-53

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.278.48

Citation:

Cite this paper

Online since:

July 2018

Authors:

Hao Liang

Keywords:

Magnetron Sputtering, ZnO Substrate Material, ZnO TFT

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

References

[1] Bagchi D, Maji T K and Sardar S 2017 Sensitized ZnO nanorod assemblies to detect heavy metal contaminated phytomedicines: spectroscopic and simulation studies J. Physical Chemistry Chemical Physics 3 2503-2513.

DOI: 10.1039/c6cp08016b

Google Scholar

[2] Bi D, Boschloo G and Schwarzmüller S 2013 Efficient and stable CH 3 NH 3 PbI 3-sensitized ZnO nanorod array solid-state solar cells J. Nanoscale 23 11686-11691.

DOI: 10.1039/c3nr01542d

Google Scholar

[3] Gedamu D, Paulowicz I and Kaps S 2014 Rapid fabrication technique for interpenetrated ZnO nanotetrapod networks for fast UV sensors J. Advanced materials 10 1541-1550.

DOI: 10.1002/adma.201304363

Google Scholar