[1]
D.M. Mattox, G.J. Kominiak, Structure modification by ion bombardment during deposition, J. Vac. Sci. Technol. A 9 (1972) 528-532.
DOI: 10.1116/1.1316677
Google Scholar
[2]
P.J. Martin, A. Bendavid, Review of the filtered vacuum arc process and materials deposition, Thin Solid Films 394 (2001) 1-14.
DOI: 10.1016/s0040-6090(01)01169-5
Google Scholar
[3]
D.M. Sanders, A. Anders, Review of cathodic arc deposition technology at the start of the new millennium, Surf. Coat. Technol. 133 (2000) 78-90.
DOI: 10.1016/s0257-8972(00)00879-3
Google Scholar
[4]
R. Aschwanden, R. Kthemann, M. Albert, C. Golla, C. Meier, Optical properties of silicon oxynitride films grown by plasma-enhanced chemical vapor deposition, Thin Solid Films, 736 (2021) 1-6.
DOI: 10.1016/j.tsf.2021.138887
Google Scholar
[5]
S.Y. Li, H.S. Lin, T.J. Zhang, J.B. Sui, C.Y. Wang, High-speed machining of malleable cast iron by various cutting tools coated by physical vapor deposition, Chin. J. Mech. Eng. 34 (2021) 1-18.
DOI: 10.1186/s10033-021-00561-8
Google Scholar
[6]
E. Hantzsche, The state of the theory of vacuum arc cathodes, Contrib. Plasma Phys. 23 (2010) 77-94.
Google Scholar
[7]
J. Zhang, Composition Control of Alloy Coatings and Composition Design of Cathode Targets in Multi-Arc Ion Plating, J. Mater. Sci. Technol. 16 (2000) 348-350.
Google Scholar
[8]
X.M. Yan, W.H. Xiong, L.Y. Zheng, F.Y. Zhou, Preparation of Gradient Hard Coatings by Multi-arc Ion Plating. Int. Mater. Rev. 20 (2006) 135-136, 142.
Google Scholar
[9]
F.Z. Wang, Advances in cathode arc ion plating technology, Vac. Cryog. 26 (2020) 87-95.
Google Scholar
[10]
Q.D. Nguyen, Q.D. Phan, D.Q. Tran, D.C. Pham, Effects of Ti target poisoning to titanium nitride coating fabricated by a physical vapor deposition technique, Appl. Mech. Mater. 889 (2019) 185-189.
DOI: 10.4028/www.scientific.net/amm.889.185
Google Scholar
[11]
K.M. Chen, X.N. Zhang, C.C. Zheng, Y. Huang, Q.F. Guan, L. Gong, C. Sun, Nitrogen partial pressure and microstructures of CrNx coating by arc ion plating, Chin. J. Vac. Sci. Technol. 30 (2010) 662-666.
Google Scholar
[12]
M.S. Li, C.J. Feng, F.H. Wang, Effect of partial pressure of reactive gas on chromium nitride and chromium oxide deposited by arc ion plating, Trans. Nonferrous Met. Soc. 16 (2006) 276-279.
DOI: 10.1016/s1003-6326(06)60190-8
Google Scholar
[13]
M. Li, F. Wang, Effects of nitrogen partial pressure and pulse bias voltage on (Ti,Al)N coatings by arc ion plating, Surf. Coat. Technol. 167 (2003) 197-202.
DOI: 10.1016/s0257-8972(02)00895-2
Google Scholar
[14]
L. Chen, Z. Pei, J. Xiao, J. Gong, C. Sun, Characterization of structure and property of TiA1N coatings deposited by filtered arc ion plating, J. Chin. Soc. Corros. Prot. 37 (2017) 241-246.
Google Scholar
[15]
C. Fei, S. Zhang, J. Li, C. Zhong, M. Li, L. Wang, Effect of nitrogen partial pressure on Al–Ti–N films deposited by arc ion plating, Appl. Surf. Sci. 58 (2011) 1819-1825.
DOI: 10.1016/j.apsusc.2011.10.053
Google Scholar
[16]
Y.H. Zhao, W.B. Shi, Z.H. Liu, S.S. Zhao, T.G. Wang, B. Yu, Progress on effects of deposition processing parameters on coatings deposition rate for arc ion plating, Vac. Cryog. 5 (2020) 385-391.
Google Scholar
[17]
V.D. Ovcharenko, A.S. Kuprin, G.N. Tolmachova, I.V. Kolodiy, A. Gilewicz, O. Lupicka, J. Rochowicz, B. Warcholinski, Deposition of chromium nitride coatings using vacuum arc plasma in increased negative substrate bias voltage, Vacuum 117 (2015) 27-34.
DOI: 10.1016/j.vacuum.2015.04.008
Google Scholar
[18]
Y.P. Pan, M.D. Huang, L. Xue, Y. Liu, S.P. Xu, Effects of negative bias on the structure and deposition rate of TiN films fabricated by arc ion plating, Vacuum 50 (2013) 20-22.
Google Scholar
[19]
G.G. Feng, C.L. Liu, L. Lu, Effects of substrate negative bias voltage on morphology and properties of film, Hot Working Technol. 42 (2013) 103-105.
Google Scholar
[20]
Q.M. Wang, K.H. Kim, Effect of negative bias voltage on CrN films deposited by arc ion plating. I. Macroparticles filtration and film-growth characteristics, J. Vac. Sci. Technol. A 26 (2008) 1258-1266.
DOI: 10.1116/1.2966432
Google Scholar
[21]
A.C. Vlasveld, S.G. Harris, E.D. Doyle, D.B. Lewi, W.D. Munz, Characterisation and performance of partially filtered arc TiAlN coatings, Surf. Coat. Technol. 149 (2002) 217-223.
DOI: 10.1016/s0257-8972(01)01448-7
Google Scholar
[22]
K.K. Sun, V.V. Le, P.V. Vinh, J.W. Lee, Effect of cathode arc current and bias voltage on the mechanical properties of CrAlSiN thin films, Surf. Coat. Technol. 202 (2008) 5400-5404.
DOI: 10.1016/j.surfcoat.2008.06.019
Google Scholar
[23]
X.A. Zeng, H. Huang, W. Zhang, H.R. Wang, Z. Liu and C.J. Qiu, Effect of arc current on microstructure and mechanical properties of Cr coatings deposited by multi-arc ion plating, Rare Met. Cem. Carb. 5 (2017) 56-59, 65.
Google Scholar
[24]
C. Ji, Q. Guo, B. Xiong, J. Li, D. Xu, Microstructure and properties of CrN coating via multi-arc ion plating on valve seat material surface, J. Alloys Compd. 891 (2021) 161966.
DOI: 10.1016/j.jallcom.2021.161966
Google Scholar