Self-Formation Supported by Pattern Recognition

Abstract:

Article Preview

Artificial planar systems self-formation process supported by pattern recognition theory and methods are discussed. Concept possibilities to apply pattern recognition power for improving and control self-formation processes are presented.

Info:

Periodical:

Solid State Phenomena (Volumes 97-98)

Edited by:

Stepas Janušonis

Pages:

51-58

DOI:

10.4028/www.scientific.net/SSP.97-98.51

Citation:

L. Telksnys "Self-Formation Supported by Pattern Recognition", Solid State Phenomena, Vols. 97-98, pp. 51-58, 2004

Online since:

April 2004

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Price:

$35.00

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