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Online since: November 2012
Authors: Jakob Kübarsepp, Kristjan Juhani, Mart Viljus, Heinrich Klaasen, Aleksei Tšinjan, Lauri Kollo
This paper discusses the effect of advanced sintering technologies – sinter + hot isostatic pressing (HIP) and sinter/HIP - on the performance of TiC-based cermets.
The advanced TiC-cermet demonstrated the blanking performance exceeding that of ordinary carbide composites by a factor of 1.5 ... 2. 3.3.
Kübarsepp, Wear of advanced cemented carbides for metalforming tool materials, Wear, 256 (2004) 846-853
Materials Science Forum, 534-536 (2007) 1169-1172
Estonian Journal of Engineering 15 (4) (2009) 283-292.
The advanced TiC-cermet demonstrated the blanking performance exceeding that of ordinary carbide composites by a factor of 1.5 ... 2. 3.3.
Kübarsepp, Wear of advanced cemented carbides for metalforming tool materials, Wear, 256 (2004) 846-853
Materials Science Forum, 534-536 (2007) 1169-1172
Estonian Journal of Engineering 15 (4) (2009) 283-292.
Online since: April 2010
Authors: Takeshi Ohshima, Kazutoshi Kojima, Shinobu Onoda, Atsushi Koizumi, Kazuo Uchida, Shinji Nozaki, Naoya Iwamoto
Nozaki1
1
Department of Electronic Engineering, The University of Electro-Communications,
1-5-1 Chofugaoka, Chofu, Tokyo 182-8585, Japan
2
Radiation Effects Group, Japan Atomic Energy Agency,
1233 Watanuki, Takasaki, Gunma, 370-1292, Japan
3
Energy Semiconductor Electronics Research Laboratory, National Institute of Advanced Industrial
Science and Technology, 1-1-1, Umezono, Tsukuba, Ibaraki, 305-8568, Japan
a
iwamoto.naoya@jaea.go.jp
Keywords: pn diode, charge collection efficiency, particle detector, electron irradiation
Abstract.
The epitaxial layers were grown on 6H-SiC n-type substrates (CREE, 3.5o off, Si-face) by hot-wall chemical vapor deposition (CVD) at National Institute of Advanced Industrial Science and Technology (AIST).
Forum, Vol. 615-617 (2009), p.861 [3] F.
Forum, Vol. 600-603 (2009) p.1043 [5] F.
The epitaxial layers were grown on 6H-SiC n-type substrates (CREE, 3.5o off, Si-face) by hot-wall chemical vapor deposition (CVD) at National Institute of Advanced Industrial Science and Technology (AIST).
Forum, Vol. 615-617 (2009), p.861 [3] F.
Forum, Vol. 600-603 (2009) p.1043 [5] F.
Online since: June 2015
Authors: Heinz Mitlehner, Lothar Frey, Tobias Erlbacher, Anton J. Bauer, Andreas Hürner, Luigi di Benedetto
Frey1),3)
1) University of Erlangen-Nuremberg, Chair of Electron Devices, Cauerstrasse 6, 91058 Erlangen, Germany
2) University of Salerno, Department of Industrial Engineering, Via Giovanni Paolo II, 132, 84084, Fisciano (SA), Italy.
3) Fraunhofer IISB, Schottkystrasse 10, 91058 Erlangen, Germany
E-mail: andreas.huerner@leb.eei.uni-erlangen.de
Keywords: Junction Termination Extension, Simulation, Double-Ring
Abstract.
Because the internal ring is fabricated simultaneously with the contact implantation and the external ring simultaneously with the single-jte implantation, in comparison to advanced multi-zone JTE-designs no additional implantation steps are mandatory [5].
Because of the large distance of the critical electric field from the mesa-transition, the dependence of the maximum achievable breakdown voltage on the angle of the mesa-transition, and thereby the requirement on advanced etching techniques is reduced drastically.
[4] Nguyen, D.M.; Huang, R.; Phung, L.V.; Planson, D.; Berthou, M.; Godignon, P.; Vergne, B.; and Brosselard, P., “Edge termination design improvements for 10kV 4H-SiC bipolar diodes” Material Science Forum, Vols. 740-742, pp. 609, 612, 2013
[7] Peters D., et al., 2010, Materials Science Forum, Vols. 645-648, pp. 901, 904, 2010
Because the internal ring is fabricated simultaneously with the contact implantation and the external ring simultaneously with the single-jte implantation, in comparison to advanced multi-zone JTE-designs no additional implantation steps are mandatory [5].
Because of the large distance of the critical electric field from the mesa-transition, the dependence of the maximum achievable breakdown voltage on the angle of the mesa-transition, and thereby the requirement on advanced etching techniques is reduced drastically.
[4] Nguyen, D.M.; Huang, R.; Phung, L.V.; Planson, D.; Berthou, M.; Godignon, P.; Vergne, B.; and Brosselard, P., “Edge termination design improvements for 10kV 4H-SiC bipolar diodes” Material Science Forum, Vols. 740-742, pp. 609, 612, 2013
[7] Peters D., et al., 2010, Materials Science Forum, Vols. 645-648, pp. 901, 904, 2010
Online since: February 2014
Preface
This volume contains papers contributed to the 2013 4th International
Conference on Advances in Materials and Manufacturing (ICAMMP 2013) held
on 18-19 December, 2013 in Kunming, China.
The International Conference on Advances in Materials and Manufacturing is the premier forum for the presentation of new advances and research results in the field of materials and manufacturing processes.
This conference series brings together leading researchers, engineers, and scientists in the materials and processes field through the world.
All papers published in this volume of Advanced Materials Research have been peer reviewed through processes administrated by the organizing committee.
Studies presented in this book cover these topics: Composites, Micro/Nano Materials, Steel/Iron, Ceramics, Metal Alloy Material, Optical / Electrical / Magnetic Materials, Energy Materials, Biomaterials and Technology, Chemical Materials, Film Material, Building Materials, Materials Mechanical Behavior and Fracture, Materials Physics and Chemistry, Selection, Testing and Evaluation of Materials, Surface Engineering / Coatings Technology, Material Forming, Material Machining, Welding and Joining, Materials Processing Technologies, etc.
The International Conference on Advances in Materials and Manufacturing is the premier forum for the presentation of new advances and research results in the field of materials and manufacturing processes.
This conference series brings together leading researchers, engineers, and scientists in the materials and processes field through the world.
All papers published in this volume of Advanced Materials Research have been peer reviewed through processes administrated by the organizing committee.
Studies presented in this book cover these topics: Composites, Micro/Nano Materials, Steel/Iron, Ceramics, Metal Alloy Material, Optical / Electrical / Magnetic Materials, Energy Materials, Biomaterials and Technology, Chemical Materials, Film Material, Building Materials, Materials Mechanical Behavior and Fracture, Materials Physics and Chemistry, Selection, Testing and Evaluation of Materials, Surface Engineering / Coatings Technology, Material Forming, Material Machining, Welding and Joining, Materials Processing Technologies, etc.
Online since: March 2011
Authors: Tsutomu Yatsuo, Kazuo Arai, Yasunori Tanaka, Koji Yano, Akio Takatsuka
980 V, 33A Normally-Off 4H-SiC Buried Gate
Static Induction Transistors
Akio Takatsuka1, a, Yasunori Tanaka1, b, Koji Yano2, c, Tsutomu Yatsuo1, d,
and Kazuo Arai3, e
1 Advanced Power Electronics Research Center, National Institute of Advanced Industrial Science and Technology, Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
2 Interdisciplinary Graduate School of Medicine and Engineering, University of Yamanashi, Takeda-4, Kofu 400-8511, Japan
3 Research and Innovation Promotion Office, National Institute of Advanced Industrial Science and Technology, Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
aa-takatsuka@aist.go.jp, byasunori-tanaka@aist.go.jp, cyano@esd.yamanashi.ac.jp, dt-yatsuo@aist.go.jp, ek-arai@aist.go.jp
Keywords: SiC, buried gate static induction transistor, normally-off, threshold voltage
Abstract.
These devices advance to practical use for example, DC-DC converter, DC circuit breaker and so on.
Forum 600-603 (2009) 1071
These devices advance to practical use for example, DC-DC converter, DC circuit breaker and so on.
Forum 600-603 (2009) 1071
Online since: June 2008
Authors: Zhuo Li, Yin Jin, J. Hou
Classification Syllogism in the Farm Vehicle Design based on the Kansei
Engineering
Z.
This is the basis of Kansei Engineering to guide the design.
Fig.4: Classification Syllogism based on Kansei Engineering.
Kansei engineering, (1995) [3] 長い町は三生まれます.
International design expert's collection of thesis of the management forum. (2004)
This is the basis of Kansei Engineering to guide the design.
Fig.4: Classification Syllogism based on Kansei Engineering.
Kansei engineering, (1995) [3] 長い町は三生まれます.
International design expert's collection of thesis of the management forum. (2004)
Online since: April 2022
Authors: Koshiro Mizobe, Katsuyuki Kida, Ryosuke Murai
Kida, Development of Fracture Surface Etching (FSE) Method around Non-Metallic Inclusion of SUJ2 Steel, Materials Science Forum, ISSN: 1662-9752, Vol. 971, pp 65-69, (2019)
Rozwadowska, Effect of repeated induction heating on fatigue crack propagation in SAE52100 bearing steel, Advanced Materials Research Vols. 217-218, pp. 1266-1271, (2011)
Kida, Observation of Fracture Surface of Induction-Heated JIS SUJ2 Bearing Steel under Rotating Bending Fatigue, Materials Science Forum, ISSN: 1662-9752, Vol. 904, pp. 24-28, (2017)
[10] Lindeburg, Michael R., Engineer-In-Training Reference Manual Eighth Edition, Professional Publications, Inc., p. 37-39, (2002)
Rozwadowska, Effect of repeated induction heating on fatigue crack propagation in SAE52100 bearing steel, Advanced Materials Research Vols. 217-218, pp. 1266-1271, (2011)
Kida, Observation of Fracture Surface of Induction-Heated JIS SUJ2 Bearing Steel under Rotating Bending Fatigue, Materials Science Forum, ISSN: 1662-9752, Vol. 904, pp. 24-28, (2017)
[10] Lindeburg, Michael R., Engineer-In-Training Reference Manual Eighth Edition, Professional Publications, Inc., p. 37-39, (2002)
Online since: June 2018
Authors: Ulrike Grossner, Bhagyalakshmi Kakarla, Selamnesh Nida, Elias Doenni, Thomas Ziemann
Planar to Trench: Short Circuit Capability Analysis of
1.2 kV SiC MOSFETs
Bhagyalakshmi Kakarlaa*, Thomas Ziemannb, Selamnesh Nidac, Elias Doennid and Ulrike Grossnere
Advanced Power Semiconductor Laboratory, ETH Zurich, Physikstrasse 3, 8092 Zurich, Switzerland
akakarla@aps.ee.ethz.ch, bziemann@aps.ee.ethz.ch, cnida@aps.ee.ethz.ch, dedoenni@student.ethz.ch, eulrike.grossner@ethz.ch
Keywords: SiC MOSFET, Planar, Trench, Short Circuit Withstand Time.
This parameter is often not specified in the datasheet but is crucial for power electronic system design engineers to limit the short circuit length in the application accordingly.
Oomori, Materials Science Forum, Vols. 600-603, pp. 1123-1126, 2009
Grossner, Materials Science Forum, Vol. 897, pp. 553-556, 2017.
This parameter is often not specified in the datasheet but is crucial for power electronic system design engineers to limit the short circuit length in the application accordingly.
Oomori, Materials Science Forum, Vols. 600-603, pp. 1123-1126, 2009
Grossner, Materials Science Forum, Vol. 897, pp. 553-556, 2017.
Online since: March 2007
Authors: Heng Zhi Fu, Lin Liu, Jun Zhang, Fa Qin Xie
Until now, directional solidification technique becomes more
and more important research area and active technology in the field of materials science and
engineering.
The aim of present paper is to describe novel directional solidifications processes and their applications to selected advanced materials.
The development of directional solidification plays the same important roles in the field materials science and engineering.
Forum, Vols.475-479 (2005), p. 665 [7] X.
Xie: Science and Technology of Advanced Materials, Vol.2 (2001), P.193
The aim of present paper is to describe novel directional solidifications processes and their applications to selected advanced materials.
The development of directional solidification plays the same important roles in the field materials science and engineering.
Forum, Vols.475-479 (2005), p. 665 [7] X.
Xie: Science and Technology of Advanced Materials, Vol.2 (2001), P.193
Online since: May 2012
Preface
The International Conference on Civil Engineering, Architecture and Building
Materials provides a forum for accessing to the most up-to-date and authoritative
knowledge from both industrial and academic worlds, sharing best practice in this
exciting field of Civil Engineering, Architecture and Building Materials.
Following the success of the inaugural conference, the 2nd CEABM was held in Yantai, China, from 25 to 27 May 2012, organized by School of Civil Engineering of Yantai University, College of Civil and Architecture Engineering of Guizhou University and Hainan Society of Theoretical and Applied Mechanics.
This conference was organized in four simultaneous tracks: "Advances in Civil Engineering", "Advances in Structures", "Advanced Building Materials and Sustainable Architecture" and "Sustainable Environment and Transportation".
The Organizing Committee of CEABM 2012 Organized by: School of Civil Engineering, Yantai University College of Civil and Architecture Engineering, Guizhou University Hainan Society of Theoretical and Applied Mechanics Conference Organization Chairman Prof.
Shilang Xu, Zhejiang University, China Senior Engineer.
Following the success of the inaugural conference, the 2nd CEABM was held in Yantai, China, from 25 to 27 May 2012, organized by School of Civil Engineering of Yantai University, College of Civil and Architecture Engineering of Guizhou University and Hainan Society of Theoretical and Applied Mechanics.
This conference was organized in four simultaneous tracks: "Advances in Civil Engineering", "Advances in Structures", "Advanced Building Materials and Sustainable Architecture" and "Sustainable Environment and Transportation".
The Organizing Committee of CEABM 2012 Organized by: School of Civil Engineering, Yantai University College of Civil and Architecture Engineering, Guizhou University Hainan Society of Theoretical and Applied Mechanics Conference Organization Chairman Prof.
Shilang Xu, Zhejiang University, China Senior Engineer.