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Fabrication and Characterization of RF Magnetron Sputtered Silicon Oxide Films

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Abstract:

In this work, silicon dioxide (SiO2) films were fabricated on indium tin oxide (ITO) coated glass substrates by radio frequency (RF) magnetron sputtering deposition technique. The deposition rate of the magnetron sputtered SiO2 films was investigated. The SiO2 films were characterized with the atomic force microscopy (AFM) for their surface topology. In addition, the electrical insulating strength of the magnetron sputtered SiO2 was examined.

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Periodical:

Advanced Materials Research (Volume 970)

Pages:

102-105

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.970.102

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Online since:

June 2014

Authors:

Jian Wei Hoon, Kah Yoong Chan*, Cheng Yang Low

Keywords:

Magnetron Sputtering, Silicon Oxide

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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