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Books by Keyword: Drying
Books
Edited by:
Prof. Andreas Öchsner, Prof. Graeme E. Murch, Prof. Ali Shokuhfar and Prof. João M.P.Q. Delgado
Online since: February 2013
Description: This special issue contains selected peer-reviewed papers presented atthe Eighth International Conference on Diffusion in Solids and Liquids(DSL-2012) held at the Hotel Kalyon Istanbul, Turkey during the period 25th-29thJune, 2012.The goal of the conference was to provide a unique opportunity toexchange information, to present the latest results as well as to review therelevant issues oncontemporary diffusion research. Young scientists were especially encouraged to attend the conference and to establish international networks with well-known scientists.
Volume is indexed by Thomson Reuters CPCI-S (WoS).
Volume is indexed by Thomson Reuters CPCI-S (WoS).
Edited by:
Paul Mertens, Marc Meuris and Marc Heyns
Online since: December 2012
Description: Volume is indexed by Thomson Reuters CPCI-S (WoS).
This volume covers various aspects of ultra-clean technology for the large-scale integration of semiconductors. These include cleaning and contamination control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing, as well as cleaning for semiconductor photo-voltaic applications. Also covered are studies of general topics such as particle removal using acoustic enhancement, the removal of metallic contamination, pattern collapse of fine flexible and fragile features, wetting and drying, contamination control and contamination metrology. The FEOL and BEOL contributions also treat the surface chemistry of silicon and other semiconductors, cleaning related to new gate stacks, cleaning at the interconnect level, resist strip and polymer removal, cleaning and contamination control for various new materials and cleaning following CMP (chemical mechanical polishing).
This volume covers various aspects of ultra-clean technology for the large-scale integration of semiconductors. These include cleaning and contamination control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing, as well as cleaning for semiconductor photo-voltaic applications. Also covered are studies of general topics such as particle removal using acoustic enhancement, the removal of metallic contamination, pattern collapse of fine flexible and fragile features, wetting and drying, contamination control and contamination metrology. The FEOL and BEOL contributions also treat the surface chemistry of silicon and other semiconductors, cleaning related to new gate stacks, cleaning at the interconnect level, resist strip and polymer removal, cleaning and contamination control for various new materials and cleaning following CMP (chemical mechanical polishing).
Edited by:
Prof. Andreas Öchsner, Prof. Graeme E. Murch, Prof. Ali Shokuhfar and Prof. João M.P.Q. Delgado
Online since: April 2012
Description: This special issue of Defect and Diffusion Forum contains selected refereed papers which were presented at the 7th International Conference on Diffusion in Solids and Liquids (DSL-2011) held on the 26 to 30th June 2011 at the Hilton Vilamoura, Algarve, Portugal. The goal of the conference was to provide a unique opportunity to exchange information, to present the latest results and review burning issues in contemporary diffusion research. Young scientists were especially encouraged to attend the conference and to establish international links with established scientists.
Volume is indexed by Thomson Reuters CPCI-S (WoS)
Volume is indexed by Thomson Reuters CPCI-S (WoS)
Edited by:
Prof. Andreas Öchsner and José Grácio
Online since: October 2006
Description: Volume is indexed by Thomson Reuters CPCI-S (WoS).