Books by Keyword: Plasma Deposition

Description: This book comprises the contributions to the sixth conference on polycrystalline semiconductors (POLYSE).
Volume is indexed by Thomson Reuters CPCI-S (WoS).
The conference covered many aspects of polycrystalline semiconductors, but was more applications-oriented than on previous occasions; thereby reflecting the rapid evolution of these technologies. POLYSE 2000 brought together research specialists from >basic research, as well as from research & development engineering, all of whom are working on devices such as thin-film transistors, micro-electromechanical systems, or sensors and actuators. In particular, ten internationally recognized scientists (J. Morante, S.Périchon, M. Konagai, S. Wagner, R. Hagenbeck, D.A. Bonnell, G. Horowitz, T.Fuyuki, J. Kocka and V. Chuwere) were invited to review their work on several interesting and promising aspects of the subject: such as, micro-systems, solar cells, thin-film transistors, organic polycrystalline devices and polycrystalline ceramics.

Description: Containing 42 invited papers, this fine book covers a broad range of subjects on plasmas and applications.
In the first section, plasma properties and methods used to characterize the plasma are addressed. Many of these papers also cover deposition or etching of particular materials. The second part focuses on the application of various plasma techniques used to deposit thin films, and on the resulting film properties. Finally, the application of plasma etching to the fabrication of silicon-based circuits, plasma etching of III-V compound semiconductors and other processing applications are discussed in the third and last section.

Description: Amorphous, hydrogenated carbon (AHC) films can be deposited on various substrates using several techniques, e.g. plasma deposition and ion beam deposition. The resulting films can be hard, wear resistant and transparent.

Description: Boron nitride thin films can be deposited on different substrates using techniques such as plasma deposition, ion beam deposition and reactive sputter deposition.