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Books by Keyword: Vapour Deposition
Books
Edited by:
Dr. Mohd Syamsul Nasyriq Samsol
Online since: March 2020
Description: International Conference on Semiconductor Materials and Technology (ICoSeMT 2019, 29-30 April 2019, Penang, Malaysia) was an inaugural event organized by the Institute of Nano Optoelectronics Research and Technology (INOR) and Universiti Sains Malaysia (USM) in conjunction with the 50th Anniversary of USM. This volume presents for readers the collection of papers that were represented on this event and reflects the modern trends in the area of materials science and technologies for opto- and microelectronics, photovoltaic systems, and photocatalysis, in analyze properties of modern functional materials, polymers, and composites. This collection will be useful for specialists from many branches of modern manufacture.
Edited by:
E.J. Mittemeijer
Online since: May 1994
Description: These Proceedings provide a picture of the current knowledge and technology of heat treatment and surface engineering. Most recent developments concerning the thermodynamics and kinetics of the underlying processes are presented here. Special emphasis is placed on process control and computer modelling.
Edited by:
J. J. Pouch and S. A. Alterovitz
Online since: October 1993
Description: Containing 42 invited papers, this fine book covers a broad range of subjects on plasmas and applications.
In the first section, plasma properties and methods used to characterize the plasma are addressed. Many of these papers also cover deposition or etching of particular materials. The second part focuses on the application of various plasma techniques used to deposit thin films, and on the resulting film properties. Finally, the application of plasma etching to the fabrication of silicon-based circuits, plasma etching of III-V compound semiconductors and other processing applications are discussed in the third and last section.
In the first section, plasma properties and methods used to characterize the plasma are addressed. Many of these papers also cover deposition or etching of particular materials. The second part focuses on the application of various plasma techniques used to deposit thin films, and on the resulting film properties. Finally, the application of plasma etching to the fabrication of silicon-based circuits, plasma etching of III-V compound semiconductors and other processing applications are discussed in the third and last section.
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