Thin Films and Porous Materials

Review from Ringgold Inc., ProtoView: This volume collects 48 of the papers presented at the May 2008 conference on the deposition, characterization, and uses of thin films. The primarily French and Algerian contributors investigate the physico-chemical properties of hydrogenated amorphous carbon thin films, fluorine-doped silicon oxide films prepared by plasma enhanced chemical vapor deposition, zinc oxide thin films grown on silicon substrates, and tin dioxide thin films. Other topics include nanocrystal non-volatile memory devices, a comparison of arylene-vinylene polymers, the effect of chromium and vanadium on nanolayered ternary carbides, and an FET gas sensor based on porous silicon.