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HomeMaterials Science ForumMaterials Science Forum Vols. 338-342Growth of CVD Thin Films and Thick LPE 3C SiC in a...

Growth of CVD Thin Films and Thick LPE 3C SiC in a Specially Designed Reactor

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Silicon Carbide and Related Materials - 1999

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Periodical:

Materials Science Forum (Volumes 338-342)

Pages:

241-244

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.338-342.241

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Online since:

May 2000

Authors:

André Leycuras

Keywords:

CVD and LPE Reactor for SiC, Hot Wall Resistive Heating Reactor

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© 2000 Trans Tech Publications Ltd. All Rights Reserved

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