Paper Titles
Direct Mixing Cleaning Method of Aqua Regia on Wafer
p.245
Single Backside Cleaning on Silicon, Silicon Nitride and Silicon Oxide
p.249
The Degradation Prevention of Resin Materials for Semiconductor Manufacturing Equipment by Applying the Ultra-High Purity Gas Supply Technology
p.255
Measurement and Control of Airborne Molecular Contamination during Wafer Storage and Transport
p.259
Purification of Trace Amount of Metal Impurity from Ultra Pure Water Using Membrane Purifier/Filter
p.265
Metal Contamination on Silicon Surfaces from Solvents
p.269
Adhesion and Removal of Alumina Slurry Particles on Wafer Surfaces in Cu CMP
p.275
A Force Study in Brush Scrubbing
p.279
Dissolution Characteristics of Ceria in Ascorbic Acid Solutions with Implications to Cleaning
p.283

Purification of Trace Amount of Metal Impurity from Ultra Pure Water Using Membrane Purifier/Filter

Article Preview

Abstract:

You might also be interested in these eBooks
Ultra Clean Processing of Silicon Surfaces VII View Preview

Info:

Periodical:

Solid State Phenomena (Volumes 103-104)

Pages:

265-268

DOI:

https://doi.org/10.4028/www.scientific.net/SSP.103-104.265

Citation:

Cite this paper

Online since:

April 2005

Authors:

Yukio Hashimoto, Mutsuhiro Amari, Makoto Komatsu, Kunio Fujiwara

Keywords:

Filter, Metal, Purifier, Ultra Pure Water

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

© 2005 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

References

[1] B. Parekh, K. Fujiwara, M. Komatsu, Y. Hashimoto, M. Amari: Clean Rooms, Vol. 17, No. 6, (June 2003).

Google Scholar

[2] B. Parekh, Y. Hashimoto, M. Amari, I. Funahashi: A2C2 Magazine, http://www.a2c2.com, (January 2004).

Google Scholar

[3] Dow Chemical Technical Information, "Dowex Ion Exchange Resins, Using Ion exchange Resin Selectivity Coefficient", http://www.dow.com. Figure 1: SEM Graft Membrane: A) HDPE non-woven, B) UPE micro porous membrane. Figure 2; Metal challenge to IE membrane, Cu, Na 50 ppb. 47 mmφDisc membrane, 20 ml/min Figure 3; Colloidal Fe purification, laminated membrane. 47mmφDisc membrane, pH 4.5, Fe 200 ppb. Figure 4; Metal impurity level with metal purifier/filter UPW line at device manufacture. Figure 5; Evaluation, MCLT comparison with and with out Metal Purifier/Filter.

DOI: 10.4028/www.scientific.net/ssp.103-104.265

Google Scholar