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Ultra Clean Processing of Semiconductor Surfaces IX

Solid State Phenomena Volumes 145 - 146

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• p47 Pattern Collapse and Particle Removal Forces of Interest to Semiconductor Fabrication Process   [ 2 M ]
  Authors: Tae Gon Kim, Kurt Wostyn, Jin Goo Park, Paul W. Mertens, Ahmed A. Busnaina
• p51 Applications of Electrostatic Spray Techniques to Surface Cleaning   [ 301 K ]
  Authors: Ken Finster, Robert Small, Andrea Belz, John Mahoney, Julius Perel, Jian Gong
• p55 Analyzing the Collapse Force of Narrow Lines Measured by Lateral Force AFM Using an Analytical Mechanical Model   [ 222 K ]
  Authors: Kurt Wostyn, Tae Gon Kim, Paul W. Mertens, Jin Goo Park
• p61 Reduced Particle Removal Efficiency Upon Wafer Storage   [ 513 K ]
  Authors: D. Martin Knotter, Romuald Roucou, Rémi Peyrin
• p65 Local Distribution of Particles Deposited on Patterned Surfaces   [ 388 K ]
  Authors: Faisal Wali, D. Martin Knotter, Twan Bearda, Paul W. Mertens
• p69 Particle Retention Mechanism of Filter in High Temperature Chemical   [ 224 K ]
  Authors: Takuya Nagafuchi, Koji Chiba, Isamu Funahashi, Minako Inukai, Hiroaki Yamada, Kaori Umezawa, Hiroshi Tomita
• p73 Improving Process Control for Copper Electroplating through Filter Membrane Optimization   [ 380 K ]
  Authors: Ai Wen Wu, Gregg Cornner, Vinay Prabhaker
• p77 Particle – Wafer Interactions in Semiaqueous Silicon Cleaning Systems   [ 2 M ]
  Authors: Lukasz Hupka, Jakub Nalaskowski, Nishant Sinha, Joseph N. Greeley, Zak Clark, Hao Du, William P. Johnson, Jan D. Miller
• p87 Drying of High Aspect Ratio Structures: A Comparison of Drying Techniques via Electrical Stiction Analysis   [ 228 K ]
  Authors: Antoine Pacco, Masayuki Wada, Twan Bearda, Paul W. Mertens
• p91 Relationship between Atmospheric Humidity and Watermark Formation in IPA Dry of Si Wafer after HF Clean   [ 2 M ]
  Authors: N. Kurumoto, Atsuro Eitoku, Katsuhiko Miya
• p97 Complementary Metrology within a European Joint Laboratory   [ 1 M ]
  Authors: Andreas Nutsch, Burkhard Beckhoff, Roswitha Altmann, J.A. Van den Berg, D. Giubertoni, Philipp Hoenicke, M. Bersani, Andreas Leibold, F. Meirer, Matthias Müller, G. Pepponi, Michael Otto, P. Petrik, M. Reading, Lothar Pfitzner, Heiner Ryssel
• p101 Highly Sensitive Detection of Inorganic Contamination   [ 226 K ]
  Authors: Burkhard Beckhoff, Andreas Nutsch, Roswitha Altmann, G. Borionetti, C. Pello, Maria Luisa Polignano, Davide Codegoni, Salvo Grasso, Elena Cazzini, M. Bersani, P. Lazzeri, S. Gennaro, Michael Kolbe, Matthias Müller, P. Kregsamer, Florian Posch
• p105 Trace Metallic Contamination Analysis on Wafer Edge and Bevel by TXRF and VPD-TXRF   [ 428 K ]
  Authors: Hikari Takahara, Ken Tsugane
• p109 Surface Potential Difference Imaging Applied to Wet Clean Monitoring   [ 1 M ]
  Authors: Adrien Danel, S. Sage, M.C. Roure, D. Peters, Jeff Hawthorne, R. Spicer
• p115 Metallic Contamination Control in Leading-Edge ULSI Manufacturing   [ 668 K ]
  Authors: Ayako Shimazaki, Hiroki Sakurai, Masao Iwase, Reiko Yoshimura, Tsukasa Tada