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Articles by author: Atsuro Eitoku

• Aging Phenomena in the Removal of Nano-Particles from Si Wafers
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p155)
• All Wet Photoresist Strip by Solvent Aerosol Spray
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p285)
• Application of Single-Wafer Wet Cleaning Prior to Epitaxial SiGe Process
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p173)
• Challenges of Single-Wafer Wet Cleaning for Low Temperature Pre-Epitaxial Treatment of SiGe
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p243)
• Impact of Galvanic Corrosion on Metal Gate Stacks
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p215)
• Influences of Oxide Loss on Contamination Removal
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p177)
• Relationship between Atmospheric Humidity and Watermark Formation in IPA Dry of Si Wafer after HF Clean
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p91)
• Removal of Nano-Particles by Mixed-Fluid Jet: Evaluation of Cleaning Performance and Comparison with Megasonic
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p193)
• Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p157)
• Single-Wafer Wet Chemical Oxide Formation for Pre-ALD High-k Deposition on 300 mm Wafer
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p53)
• Study of Static Electricity in Wafer Cleaning Process
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p263)