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Articles by author: Denis Shamiryan

• Galvanic Corrosion of Stacked Metal Gate Electrodes during Cleaning in HF Solutions
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p87)
• Influence of Photoresist and BARC Selection on the Efficiency of a Post-Etch Wet Strip in BEOL Applications
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p219)
• Modification of Low-K SiCOH Film Porosity by a HF Solution
  Published in: Ultra Clean Processing of Silicon Surfaces V (p135)
• Post Extension Ion Implant Photo Resist Strip for 32 nm Technology and beyond
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p253)
• Silicon Surface Cleaning after Spacer Dry Etching
  Published in: Ultra Clean Processing of Silicon Surfaces V (p303)
• The Importance of Cavitation Hysteresis in Megasonic Cleaning
  Published in: Ultra Clean Processing of Semiconductor Surfaces X (p171)
• Wafer Backside Cleaning Strategies for High-k/Metal Gate Processing
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p241)