Papers by Author: Ismail Kashkoush

Paper TitlePage

Insights into HF-Last Processes and Particle Performance in a Single Wafer Spin Cleaning Tool
Authors: Gim Chen, Ismail Kashkoush
15
In Situ Wafer Processing for Next Generation Devices
Authors: Ismail Kashkoush, Lewis Liu, Nick Yialamas, R. Novak
45
Wafer Surface Preparation Requirements for Next-Generation Devices
Authors: Ismail Kashkoush, G. Chen, R. Novak
191
Post CMP Cleaning Using a Novel HF Compatible High Power Magasonic Tank
Authors: F. Tardif, T. Lardin, I. Constant, M. Fayolle, Pieter Boelen, C. Cowache, Ismail Kashkoush, R. Novak
169
Optimization of Deionized Water Consumption in Wafer Wet Processing
Authors: Ismail Kashkoush, R. Novak
49
New Aspects of the Diluted Dynamic Clean Process
Authors: F. Tardif, T. Lardin, A. Maciejny, Adrien Danel, Pieter Boelen, C. Cowache, Ismail Kashkoush, R. Novak
19
Showing 1 to 6 of 6 Paper Titles