HOME CONTACT My eBook

Username: Password:

> @scientific.net

Articles by author: Kenichi Sano

• Aging Phenomena in the Removal of Nano-Particles from Si Wafers
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p155)
• All Wet Photoresist Strip by Solvent Aerosol Spray
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p285)
• Application of Single-Wafer Wet Cleaning Prior to Epitaxial SiGe Process
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p173)
• Challenges of Single-Wafer Wet Cleaning for Low Temperature Pre-Epitaxial Treatment of SiGe
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p243)
• Impact of Galvanic Corrosion on Metal Gate Stacks
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p215)
• Low Temperature Pre-Epi Treatment: Critical Parameters to Control Interface Contamination
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p177)
• Removal of Nano-Particles by Mixed-Fluid Jet: Evaluation of Cleaning Performance and Comparison with Megasonic
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p193)
• Single-Wafer Wet Chemical Oxide Formation for Pre-ALD High-k Deposition on 300 mm Wafer
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p53)