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Articles by author: Lee M. Loewenstein

• Behaviour of Metallic Contaminants during Mos Processing
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p11)
• Chemistry of the Silicon Oxide Surface: Adsorption from SC1 Solutions
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p53)
• Ozonated DI-Water for Clean Chemical Oxide Growth
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p77)
• The Effect of Ion Implantation on the Metal Contamination of Silicon Surfaces in Aqueous Solution
  Published in: Ultra Clean Processing of Silicon Surfaces V (p7)
• The Rinsing Problem: Effect of Solute-Surface Interactions on Wafer Purity
  Published in: Ultra Clean Processing of Silicon Surfaces IV (p1)