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Articles by author: Vladimir V. Voronkov

• A Perspective from Crystal Growth and Wafer Processing on the Properties of Intrinsic Point Defects in Silicon
  Published in: Defects and Diffusion in Semiconductors IV (p125)
• Anomalous Out-Diffusion Profiles of Nitrogen in Silicon
  Published in: Gettering and Defect Engineering in Semiconductor Technology XIII (p149)
• Defect Formation in Dislocation-Free Silicon Containing Oxygen
  Published in: Gettering and Defect Engineering in Semiconductor Technology (p171)
• Defect Formation in Dislocation-Free Silicon Containing Oxygen
  Published in: Gettering and Defect Engineering in Semiconductor Technology (p603)
• Elastic Instability of Strained Spherical Precipitates as a Cause of Oxide Platelets in Silicon
  Published in: Gettering anf Defect Engineering in Semiconductor Technology IX (p121)
• Evolution of Thermal Donors in Silicon Enhanced by Self-Interstitials
  Published in: Gettering and Defect Engineering in Semiconductor Technology XII (p387)
• Intrinsic Point Defects in Silicon Crystal Growth
  Published in: Gettering and Defect Engineering in Semiconductor Technology XIV (p3)
• Intrinsic Point Defects in Silicon: a Unified View from Crystal Growth, Wafer Processing and Metal Diffusion
  Published in: Gettering and Defect Engineering in Semiconductor Technology XI (p1)
• Morphological Transformation of Oxide Particles and Thresholds for Effective Gettering in Silicon
  Published in: Gettering and Defect Engineering in Semiconductor Technology XI (p97)
• Multiplicity of Nitrogen Species in Silicon: The Impact on Vacancy Trapping
  Published in: Gettering and Defect Engineering in Semiconductor Technology XII (p219)
• Nitrogen Diffusion and Interaction with Oxygen in Si
  Published in: Gettering and Defect Engineering in Semiconductor Technology X (p83)
• Nitrogen Out-Diffusion from Czochralski Silicon Monitored by Depth Profiles of Shallow Thermal Donors
  Published in: Gettering and Defect Engineering in Semiconductor Technology X (p117)
• Properties of Fast-Diffusing Oxygen Species in Silicon Deduced from the Generation Kinetics of Thermal Donors
  Published in: Gettering and Defect Engineering in Semiconductor Technology XIII (p115)
• Rapid Thermal Processing and the Control of Oxygen Precipitation Behaviour in Silicon Wafers
  Published in: Rapid Thermal Processing and beyond: Applications in Semiconductor Processing (p45)
• Recombination at Oxide Precipitates in Silicon
  Published in: Gettering and Defect Engineering in Semiconductor Technology XIV (p205)