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Articles by author: Z.Lj. Petrović

• Comparison of Direct Numerical Procedure and Monte Carlo Technique to Determine the Charging Effects in Submicron Structures
  Published in: Progress in Advanced Materials and Processes (p9)
• Data Bases for Modeling Plasma Devices for Processing of Integrated Circuits
  Published in: Progress in Advanced Materials and Processes (p15)
• Influence of Charging on SiO₂ Etching Profile Evolution Etched by Fluorocarbon Plasmas
  Published in: Research Trends in Contemporary Materials Science (p53)
• Low Pressure RF Capacitively Coupled Plasma Reactor for Modification of Seeds, Polymers and Textile Fabrics
  Published in: Current Research in Advanced Materials and Processes (p291)
• Modeling of a Plasma Etcher for Charging Free Processing of Nanoscale Structures
  Published in: Recent Developments in Advanced Materials and Processes (p57)
• Neutralization of Ion Beams for Reduction of Charging Damage in Plasma Etching
  Published in: Current Research in Advanced Materials and Processes (p297)
• Nonequilibrium Plasmas for Material Processing in Microelectronics
  Published in: Advanced Materials and Processes (p47)
• Particle-In-Cell Modelling of a Neutral Beam Source for Material Processing in Nanoscale Structures Fabrication
  Published in: Research Trends in Contemporary Materials Science (p47)
• The Effect of Nucleants on the Crystallization Behavior of Isotactic Polypropylene
  Published in: Progress in Advanced Materials and Processes (p509)
• The Influence of Surface Modification on Related Functional Properties of Wool and Hemp
  Published in: Current Research in Advanced Materials and Processes (p283)