Papers by Keyword: Secondary Ion Mass Spectroscopy (SIMS)

Abstract: Redistributions of implanted species after thermal annealing in polycrystalline silicon (poly-silicon) were studied by secondary ion mass spectrometry. Ten different elements were implanted into poly-silicon films grown on Si substrates. The implanted energies were chosen such that the expected ion range is within the poly-silicon film. Thermal anneals were carried out at temperatures between 300°C and 1000°C in flowing high purity Ar gas. Three different diffusion behaviors have been observed for these elements. For Be, Na, Ga, and Cr, most of the implanted ions diffused out to the surface of the poly-silicon film after anneal at 1000°C. For K, Ca, Ti, and Ge, the impurity ions diffused deeper into the bulk after anneal at 1000°C. For Cl and Mn ions, the concentration distributions became narrower when annealed at high temperatures.

Abstract: The self-diffusion of nitrogen is studied in amorphous silicon nitride, which is a model system for a covalently bound amorphous solid with a low atomic mobility where reliable diffusion data are still lacking. Comparative experiments on Si14Nx/Si15Nx (x ≈ 1.33) isotope multilayers were carried out with secondary ion mass spectrometry (SIMS) and neutron reflectometry (NR), respectively. It was found that experiments with SIMS are not very well suited for the determination of diffusivities in a broad temperature range. The minimum diffusion length of about 5-10 nm detectable with this method is too large. At high temperatures (> 1200 °C) the amorphous solid crystallizes before any diffusion is measured and at low temperatures (< 1100 °C) the diffusivities are too low to be detected. In contrast, with neutron reflectometry diffusion lengths in the order of 1 nm and diffusivities down to 10-24 m2 s-1 were measured between 950 and 1250 °C. The potential of this method for the determination of ultra slow diffusion processes is discussed.

Abstract: The accuracy of Secondary Ion Mass Spectrometry (SIMS) depth profiles of aluminum (Al) dopant in silicon carbide (SiC) has been investigated. The Al SIMS profile differs in shape depending on whether it was obtained using a cesium (Cs+) or oxygen (O2 +) primary ion beam, and depends in the former case on which secondary ion is followed. The matrix signals indicate that the CsAl+ secondary ion yield changes during the Cs+ depth profile, probably because of the work function lowering due to the previously-implanted Al. These same matrix ion signals are used for a depth-dependent empirical correction to increase the accuracy of the Al concentration profile. The physics of these phenomena and the accuracy of the correction are discussed.

Abstract: A multiple data point version of the industry standard, two data point raster-changing procedure is employed to measure low levels (< 1 x 1017 atoms/cm3) of nitrogen (N) in silicon carbide (SiC) by SIMS (Secondary Ion Mass Spectrometry). A current-changing procedure is also employed. Together, these are used evaluate the assumptions of the standard method, to separate and measure the components of background signal, and to improve upon the precision and accuracy of the standard method. The risk of poor precision in the two-point method is demonstrated, as is the improvement provided by the multiple-point method. Results show that, in addition to the wellknown N memory background, adsorption background can contribute significantly to the N signal. In general, establishing the presence of adsorption gas in this way can be used to warn of the presence of ionization background, which is not measurable per se.

Abstract: The electrochemical reaction of solid oxide fuel cells (SOFCs) was reviewed in terms of mass and charge transports of reaction species around the electrode/electrolyte interfaces. Oxygen reduction and fuel oxidation were analyzed by isotope labeling and secondary ion mass spectrometry as well as conventional electrochemical method. The SIMS images after 18O2 (stable isotope oxygen) labeling suggested that the O2/cathode/electrolyte interfaces were the most active parts for oxygen reduction and incorporation. The widths of active parts of oxygen reduction were about several 100 to some 1000 nm different depending on the cathode materials and reaction mechanism. The isotope labeling-SIMS technique was also applied to visualize the active parts for CH4 decomposition and carbon deposition around the anode metal/electrolyte oxide interfaces. The active parts for carbon deposition were only on the Ni surface on YSZ electrolyte. The effect of substrate oxide on the carbon deposition was also examined at the mesh-shaped metal/oxide interfaces.

Abstract: The superplastic flow in tetragonal zirconia polycrystals stabilised 3mol% Y2O3 (3YTZP) is strongly affected by the dopant cations, which segregate at the grain boundary. It is proposed that this flow is controlled by grain boundary diffusion of Zr4+ ions and therefore the dopant cations should change the grain boundary diffusion. In order to prove this thesis the measurements of grain boundary diffusion coefficients were made using Hf4+ ions as tracer. Zirconia samples were doped with 1mol% of Al2O3, SiO2, MgO, MgAl2O4, GeO2 and TiO2. The tracer was deposited on the surface of the zirconia specimens by placing several drops of hafnium nitrate and then drying at 373 K. In this way, thin films of HfO 2 were obtained. The samples were heated in the range 1553 – 1773 K for 1 to 24 h. The concentration versus depth profiles were measured using secondary ion mass spectrometry (SIMS). Calculated hence grain boundary diffusion coefficients were several times bigger for doped samples than for pure 3Y-TZP samples.

Abstract: The defect structure of undoped ZnO and (Zn1-x,Mgx)O solid-solution films were deposited on YSZ substrate with pulsed laser deposition (PLD) to investigate defect equilibria in those films. In particular, the effects of thermal treatment on the structures and prosperities of (Zn1-x,Mgx)O
solid-solution films were examined. The films with high MgO concentration (x>0.12) decomposed to the wurtzite-type and rock-salt-type phase after thermal treatment, indicating that the solubility limit of Mg was about x=0.12 and the wurtzite-type (Zn,Mg)O films with x>0.12 were indicated to be non-equilibrium ones. The subsequent analyses of oxygen diffusivity in those films revealed that the films under non-equilibrium state, i.e., wurtzite-type (Zn1-x,Mgx)O with x>0.12, contained significantly high concentration of anion defects.

Abstract: A compact angle-resolved secondary ion mass spectrometer (AR-SIMS) with a special geometrical configuration, composing of a differentially pumped micro-beam ion-gun, a tiltable sample stage and a time-of-flight (TOF) mass spectrometer was applied to measure angular distribution (AD) of secondary ions ejected from VN by oblique 3 keV Ar+ sputtering at room temperature. AD of V+ was almost identical with that of N+, strongly suggesting that Gibbsian segregation did not take place during sputtering. Since the angular dependence of VN+/V+ and V2 +/V+ intensity ratios was independent of that of N+ and V+ intensities, VN+ and V2 + dimer ions were generated via the “as such” direct emission process.

Abstract: The defect structure of undoped and Al-doped ZnO films deposited by pulse laser deposition was investigated to understand the charge compensation mechanism in those films. Particularly, the effect of oxidation assist, i.e., O2 gas or oxygen radicals, on the defect structure of the resultant films was examined. The examination indicated that the defect structure of undoped ZnO was not affected by the oxidation assist, whereas the properties of Al-doped ZnO obviously varied with the method of oxidation assist. An analyses of oxygen diffusion in these films revealed that Al-doping enhanced formation of oxygen defects in Al-doped ZnO.

Abstract: The diffusion coefficient of In in TiAl has been measured using ion implantation technique and secondary ion mass spectrometry. The diffusion coefficients of Fe and Pd in FePt have been measured at two compositions by radioactive tracer method. In order to clarify diffusion anisotropy, single crystal of each alloy was used. The In diffusion perpendicular to the [001] axis is faster than that parallel to the [001] axis. Such trend is similar to Ti diffusion previously measured in our group. The diffusion of Fe in FePt perpendicular to the [001] axis is faster than that parallel to the [001] axis at each composition, while the anisotropy of the Pd diffusion is different with composition. The predominant process of the diffusion in perpendicular to the [001] has been discussed on the basis of the expressions of the diffusion coefficients.