Papers by Keyword: Thick Film

Abstract: In the aerosol deposition method (ADM), we investigated an influence of pre-treatments for barium titanate powders as raw material on the deposition rate of thick films. By sieving and drying the powder, deposition rate of the films fabricated by ADM was effectively enhanced. On the other hand, heating the powders at 400-800°C, the resulting powders caused low deposition rate of the films. When a planetary milling was performed prior to charge aerosol chamber, the deposition rate of the films was four times higher than that in deposition using the powder without milling. By changing the milling rotation rate, we control size of agglomerated particles consisting of powders, which results in the control of deposition rate of the films.

Abstract: CaBi4Ti4O15 based thick films were prepared by screen-printing method on Si substrates. Screen-printable pastes were prepared by kneading the CaBi4Ti4O15 powder in a three-roll mill with an organic vehicle. The remanent polarization of 6.3 C/cm2 and coercive field of 130kV/cm were obtained for the CaBi4Ti4O15 with Nb2O5 1wt% thick film fired at 1130°C. The cavity structure was prepared by etching of Si substrate. The displacement-electric field butterfly curves were obtained.

Abstract: Ordered mesoporous silica (MPS) is expected to be used as an adsorbent for energy-efficient desiccant cooling systems. For practical use, it is important to be able to fabricate thick MPS coatings on metal supports. As we reported previously, MPS coatings on metal substrates can be formed using the electrophoretic deposition (EPD) method. Since MPS adsorbs a certain amount of water depending on the relative humidity, the amount of water adsorbed in MPS influences electrification, dispersion stability, and EPD behavior. In this study, we investigated the influence of water on the formation of thick MPS coatings by using an acetone bath. MPS powder was placed in a humidity-controlled vessel prior to EPD to adsorb water. The deposited amount tended to increase when dry MPS powder was used and when the water content of the acetone was reduced. In addition, the deposited amount was constant for 24 hours or more when the MPS powder was immersed in acetone containing 0.15 vol% of water. We found that dried MPS powder and acetone containing less than 0.45 vol% water were suitable for the stable preparation of thick MPS coatings. Consequently, 100 m-thick MPS coatings were successfully fabricated with the EPD method using dried MPS powder and an acetone bath containing 0.15 vol% water

Abstract: Electrophoretic deposition method was applied to prepare some solid-electrolyte thick-films of Na1+xZr2SixP3-xO12 (x = 2, 3; NASICON) and Na5DySi4O12 (NDSO) on Au-coated alumina substrates. With the ethanol-based medium, the deposition process was investigated under constant voltage mode. The concentration of the suspension and applied voltage were optimized with respect to the rate of deposition and quality of the deposit. The NASICON (Na3Zr2Si2PO12) -based solid-state ionic conductor thick-film as a host ceramic with a guest Cu+ ion has been produced as a noble phosphor thick-film by using an electrochemical ion doping method. The photoluminescence (PL) device of the NASICON:Cu+ film showed good photo-luminescent peaks near 450-500nm depending on the host materials.

Abstract: In this paper, electrophoretic deposition of multiwall carbon nanotubes (MWNTs) using low frequency (0.01-1000 Hz) AC electric fields, is reported. The effect of depositing parameters such as frequency and waveform on deposit yield is investigated. Results show that the deposit yield decreases with frequency. The rectangular waveform yields more deposit yield than sinusoidal and triangular waveforms. The deposition pattern is also different in AC and DC electric fields. This technique may be used for deposition of MWNTs thick films.

Abstract: In order to achieve AlN bulk growth, HTCVD chlorinated process is investigated. High growth rate and high crystalline quality are targeted for AlN films grown on (0001) 4H SiC at 1750°C. The precursors used are ammonia NH3 and aluminium chlorides AlClx species formed in situ by action of Cl2 on high purity Al wire. Influences of N/Al ratio in the gas phase on growth rate, crystalline state and microstructure are presented. Growth rates of up to 200 µm/h have been reached for polycrystalline layers. Thermodynamic calculations were carried out and correlated to the experimental results. As-grown AlN layers were characterized by SEM and X-ray Diffraction. Surface morphology is studied by SEM and FEG-SEM and crystallographic orientations were obtained by X-ray diffraction on θ/2θ.

Abstract: Lead zirconate titanate (PZT) thick films, a few tens of micrometres thick, are of technological interest for integration with microsystems to create micro electromechanical systems (MEMS) with high sensitivity and power output. This paper examines the challenges faced in integrating thick film PZT with other materials to create functional micro devices. Thermal, chemical and mechanical challenges associated with integration will be examined and potential solutions explored.

Abstract: Physical and electrical properties of sol-gel derived SiO2 thick film (100-130 nm) deposited on n-type 4H-SiC have been investigated. The oxide was annealed in argon gas ambient for 30 minutes at 650, 750, 850, and 950°C, in order to optimize the oxide properties. Results indicated that the oxide is denser with a significant reduction in percentage of porosity as the annealing temperature increases, except for sample annealed at 950°C. The oxide annealed at 850°C was having values of refractive index and dielectric constant close to the values reported in thermally grown SiO2 and it has demonstrated the lowest leakage current density and total interface trap density. Viscous shear flow effect has been proposed as the main contributor for the reduction of physical properties when the oxide was annealed at 950°C.

Abstract: MBi4Ti4O15 (M=Ba,Ca) thick films were prepared by screen printing and firing using Pt bottom electrodes and ZrO2 substrates. Screen-printable pastes were prepared by kneading the MBi4Ti4O15 powder in a three-roll mill with an organic vehicle. The microstructures and electric properties of the thick films were examined in comparison with bulk ceramics. The remanent polarization of 6.2 9C/cm2 and coercive field of 130kV/cm were obtained for the CaBi4Ti4O15 thick film fired at 1130OC. The Curie points of MBi4Ti4O15 (M=Ba,Ca) thick films from dielectric peaks were 450OC and 790 OC for M=Ba and M= Ca.

Abstract: The oxidation kinetics, electrical properties, microstructure and chromium vaporization effects of the oxide products formed on Fe-25 wt.-%Cr steel uncoated and coated with films of (La,Sr)CrO3, (La,Sr)CoO3, (La,Sr)(Co,Fe)O3, Mn1.5Cr1.5O4 and MnCo2O4 in air and the Ar-H2-H2O gas mixture at 1023−1173 K for up to 840 h with regard to their application as SOFC metallic interconnect were investigated. To improve poor electrical conductivity of chromia scales and to suppress chromium vaporization from this scale grown on uncoated steel during oxidation, the perovskite and spinel thick films composed of paste prepared via co-precipitation-calcination and ultrasonic spray pyrolysis methods were applied. Perovskite and spinel coatings decreased the volatilization rate of chromia species in comparison with the value of this parameter corresponding to oxide scales built mainly of chromia formed on uncoated steel. Microstructure investigations by the SEM-EDS method and electrical resistance measurements revealed the significant influence of the formation of multilayer reaction products at the steel/coating interface on the electrical properties of the composite materials used for the construction of the SOFC metallic interconnect.