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Articles by keyword: «Ultra Shallow Junction»

• An Overview of ms Annealing for Deep Sub-Micron Activation
  Published in: Rapid Thermal Processing and beyond: Applications in Semiconductor Processing (p257)
• Complementary Metrology within a European Joint Laboratory
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p97)
• Evaluation of Plasma Strip Induced Substrate Damage
  Published in: Ultra Clean Processing of Semiconductor Surfaces IX (p249)
• Implant Annealing – An Evolution from Soak over Spike to Millisecond Annealing
  Published in: Rapid Thermal Processing and beyond: Applications in Semiconductor Processing (p207)
• Local Density Diffusivity (LDD-) Model for Boron Out-Diffusion of In Situ Boron-Doped Si_0.75Ge_0.25 Epitaxial Films Post Advanced Rapid Thermal Anneals with Carbon Co-Implant
  Published in: Defects and Diffusion, Theory & Simulation II (p63)
• Nano-Surface Modification of Silicon with Ultra-Short Pulse Laser Process
  Published in: Technology Evolution for Silicon Nano-Electronics (p117)
• Non-Gaussian Local Density Diffusion (LDD-) Model for Boron Diffusion in Si- and Si_xGe_1-x Ultra-Shallow Junction Post-Implant and Advanced Rapid-Thermal-Anneals
  Published in: Defects and Diffusion in Metals XII (p71)
• Ultra-Rapid Thermal Process for ULSIs
  Published in: Rapid Thermal Processing and beyond: Applications in Semiconductor Processing (p319)
• Ultra-Shallow Junction Formation Using Rapid Thermal Processing
  Published in: Rapid Thermal Processing and beyond: Applications in Semiconductor Processing (p305)