Study of Structure and Optical Properties of Magnetron Sputtered ZnS Thin Films by Annealing
Nanocrystalline ZnS thin films were deposited on glass substrates at 300W and 0.6Pa by using radio frequency magnetron sputtering, and then annealed at different temperatures. This work investigated the influence of ZnS buffer layer on different annealing temperature, analysed structural, surface topography, and optical properties of ZnS films by using X-ray diffraction (XRD), UV-spectroscopy measurements and scanning electronic microscope (SEM) analysis techniques. Findings showed that the film annealed at 300°C was uniformity and compact, which was zinc blende cubic structure. The film exhibited the optical transparency as high as 85% in the visible region, and its optical band gap was calculated to be 3.56 eV.
R. F. Chen et al., "Study of Structure and Optical Properties of Magnetron Sputtered ZnS Thin Films by Annealing", Applied Mechanics and Materials, Vols. 130-134, pp. 1379-1382, 2012