A Silicon Capacitive Seismic Accelerometer with a Simple Fabrication Process

Qing He; Dong Hai Qiao

doi:10.4028/www.scientific.net/AMM.130-134.4088

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 130-134A Silicon Capacitive Seismic Accelerometer with a...

A Silicon Capacitive Seismic Accelerometer with a Simple Fabrication Process

Abstract:

In this paper, a single-crystal silicon capacitive accelerometer is put forward. The accelerometer is composed of a single-crystal silicon vibration head and two backplates, forming a sandwich structure. With damping holes fabricated on backplates, the squeeze-film damping effect is reduced and a Q factor around 0.7 is obtained. This accelerometer has a simple fabricating process including wet and dry etching and ambient pressure packaging. Its tested sensitivity is 22.6pF/g and calculated noise level is lower than 100ng/√Hz, thus meets the demand of seismic applications.

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Periodical:

Applied Mechanics and Materials (Volumes 130-134)

Pages:

4088-4091

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.130-134.4088

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Online since:

October 2011

Authors:

Qing He, Dong Hai Qiao

Keywords:

Seismic Application, Silicon Capacitive Accelerometer, Simple Fabrication Process

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