Preparation and Characteristic Measurement of Born Doped Diamond Film Electrode on Tantalum Substrate and its Properties for Degradation of High COD Wastewater

Abstract:

The boron-doped diamond film electrode grown on tantalum substrate (BDD/Ta) was prepared by hot filament chemical vapor deposition (HFCVD) technique. The morphology and quality of BDD/Ta film electrode were investigated by SEM and Raman spectroscopy respectively. The electrochemical behavior of the BDD/Ta film electrodes in Na₂SO₄ solution was also investigated by cyclic voltammetry and the window potential of BDD/Ta film electrode in Na₂SO₄ solution is of 4.1V, the hydrogen and oxygen evolution potentials are of-1.8V and +2.3V respectively. The characteristic measurements of BDD/Ta film electrode and its application to degradation of high concentration organic wastewater indicated that BDD/Ta film electrode have a series of advantages, including high overpotential for oxygen revolution, high current efficiency, good removal of chemical oxygen demand (COD).

• Periodical: Applied Mechanics and Materials (Volumes 138-139)
• Pages: 612-617
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.138-139.612
• Online since: November 2011
• Authors: Cheng Yao Gao
• Keywords: Diamond Film, Electrochemical Characterization, Electrode Material, Wastewater Treatment

References

[1] A. M. S. Solano, J. H. B. Rocha, N. S. Fernandes, D. R. Da Silva, and C. A. Martinez-Huitle, Oxidation Communications, Vol. 34(2011), p.218.

[2] S. Zodi, O. Potier, F. Lapicque, and J. P. Leclerc, Desalination, vol. 261(2010), p.186.

[3] L. Szpyrkowicz, S. N. Kaul, R. N. Neti, and S. Satyanarayan, Water Research, vol. 39(2005), p.1601.

[4] C. Tan, B. Xiang, Y. J. Li, J. W. Fang, and M. Huang, Chemical Engineering Journal, vol. 166( 2011), p.15.

[5] C. R. Costa, F. Montilla, E. Morallon, and P. Olivi, Journal of Hazardous Materials, vol. 180(2010), p.429.

[6] J. Y. Choi, Y. J. Lee, J. Shin, and J. W. Yang, Journal of Hazardous Materials, vol. 179 (2010), p.762.

[7] C. Y. Zhang, J. L. Wang, H. F. Zhou, D. G. Fu, and Z. Z. Gu, Chemical Engineering Journal, vol. 161(2010), p.93.

[8] V. Santos, J. Diogo, M. J. A. Pacheco, L. Ciriaco, A. Morao, and A. Lopes, Chemosphere, vol. 79(2010), p.637.

[9] M. Chang, C. Y. Gao, and J. Y. Jiang, Journal of the Electrochemical Society, vol. 156 (2009), p. E50.