Analysis and Achievement of the Leak Detection of High Vacuum System on Magnetron Sputtering Equipment

Abstract:

Since the reform and opening, China's economy has achieved remarkable results, for various industries have developed rapidly. After 2 decades, 1950s and 1990s, China's vacuum industry also has get dramatic development and vacuum equipments have been widely applied in the electronics industry, especially in the semiconductor and integrated circuit production. This paper described the detection process and method of high vacuum magnetron sputtering equipment, utilized the one-by-one elimination to determine the key emphasis in work and succeeded in finding the cause of the substantial decline in the vacuum degree, then elaborated the results and effectiveness of detection, and finally made a conclusion. This paper has a referential significance on the maintenance of the same kind equipment.

• Periodical: Applied Mechanics and Materials (Volume 142)
• Pages: 71-74
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.142.71
• Online since: November 2011
• Authors: Jin Chun Feng, Song He Huang, Min Su
• Keywords: Leak Detection, Magnetron Sputtering, Sputtering Chamber, Vacuum Degree

References

[1] H.Y. Sun, G.Z. Gen The Influence of Sputtering Air Pressure on Zno Thin Film[J]. Journal of QIngdao University of Technology: Natural Science Edition. Vol. 24, No. 1(2011): 38-41.

[2] T. C. Ma , X. W. Hu and Y. H. Chen. The Principle of Plasma Physics [M]. Hefei : Chinese Science and Technology University Press. (1988).

[3] Z.Q. Pan. Simple Leak Detection's Main Point Analysis of Large-medium Scale Vacuum Equipment[J]. Henan Mechanical and Electrical Engineering College Learned Journal. Vol. 17, No. 5(2009), 1-4.

[4] E. Janczak-Bienk, H. Jensen and G. Sorensen, The influence of the Reactive Gas Flow on the Properties of AlN Sputter-Deposited Films. Mater. Sci. and Eng., A140(1991)696-701.

DOI: 10.1016/0921-5093(91)90499-d

[5] J. M. Zhang and Xu KW2003 Acta Phys . Sin. 52 145.

[6] D.H. Meng. Study on the leak Detection System with Cryopump as Main Pump[J]. Vacuum Vol. 47, No. 6(2010), 33-36.

[7] J. Bo. Application of Vacuum Leak Detection in the Maintenance [J]. Mechanical Manufacture Vol. 44, No. 4(2006): 65-67.

[8] W.C. Tao. etc. The Method and Application of Vacuum Leak Detection. [J] The Management and Maintenance of The equipmentVol. 47, No. 5 (2008): 21-23.

[9] Y.S. Ding. The leak Detection Technology of Vacuum Equipment [J]. Electron Technology. Vol. 30, No. 4(2009): 226-229.

[10] http: /emuch. net/html/f228. html.