Study on Properties and Preparation of Films by Unbalanced Magnetron Sputtering

Jie Jin; Jia Yang; Mao Lin Ni

doi:10.4028/www.scientific.net/AMM.184-185.1497

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 184-185Study on Properties and Preparation of Films by...

Study on Properties and Preparation of Films by Unbalanced Magnetron Sputtering

Abstract:

TiAlN films were prepared by closed field Unbalanced Magnetron Sputtering ion plating. EDS, XRD and SEM were used to test the films’ chemical composition, microstructure and surface morphology. In addition, the films’ surface microhardness, bonding strength and friction coefficient were also determined. The experimental results indicate that the TiAlN films of different substrate hardness have dense film structure and the same chemical composition, the hard substrate microhardness of the film can reach 2575 HV0.025 and soft substrate can be up to 2295 HV0.025, the bonding strength of which is respectively 59N and 56N, Friction coefficient is 0.45 and 0.5.

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Periodical:

Applied Mechanics and Materials (Volumes 184-185)

Pages:

1497-1500

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.184-185.1497

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Online since:

June 2012

Authors:

Jie Jin, Jia Yang, Mao Lin Ni

Keywords:

Friction Coefficient (FC), Microhardness, Microstructure, TiAlN Film

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References

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