Electrical and Optical Properties of Indium Tin Zirconium Oxide Films at Different Annealing Treatment Temperatures

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Indium tin oxide (ITO) and indium tin zirconium oxide (ITZO) films were deposited on glass substrates at room temperature by magnetron sputtering technology with one or two targets. Electrical and optical properties of ITO and ITZO films by air-annealing treatment were contrastively studied. ITZO films provided with the preferential crystalline orientation change from (222) to (400) plane, as well as the increase in grain size and the decrease in surface roughness. As result, zirconium -doping remarkably improved the optical-electrical properties of the films deposited at room temperature. The resistivity of ITO and ITZO films showed the trend which includes first dropping and then rising, which was closely related with the variations of carrier concentration and mobility. ITZO films had high optical transmittance of above 80% at lower annealing temperature. ITZO films prepared by co-sputtering reveal better optical-electrical properties.

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110-114

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July 2012

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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[1] S. Calnan, A.N. Tiwari, High mobility transparent conducting oxides for thin film solar cells, Thin Solid Films 518 (2010) 1839-1849.

DOI: 10.1016/j.tsf.2009.09.044

Google Scholar

[2] C. Guillen, J. Herrero, Stability of sputtered ITO thin films to the damp-heat test,Surf. Coat. Technol. 201(2006) 309-312.

DOI: 10.1016/j.surfcoat.2005.11.114

Google Scholar

[3] J.D. Nomoto, J. Oda, T. Miyata, T. Minami, Effect of inserting a buffer layer on the characteristics of transparent conducting impurity-doped ZnO thin films prepared by dc magnetron sputtering, Thin Solid Films 519(2010) 1587-1593.

DOI: 10.1016/j.tsf.2010.08.093

Google Scholar

[4] J.K. Rath, Y. Liu, M.M. Jong, J. Wild, J.Schuttauf, M. Brinza, R. Schropp, Transparent conducting oxide layers for thin film silicon solar cells, Thin Solid Films 518(2010) e129-e135.

DOI: 10.1016/j.tsf.2010.03.104

Google Scholar

[5] P. Canhola, N. Martins, L. Raniero, S. Pereira, E. Fortunato, I.Ferreira, R. Martins, Role of annealing environment on the performances of large area ITO films produced by rf magnetron sputtering, Thin Solid Films 487(2005) 271-276.

DOI: 10.1016/j.tsf.2005.01.078

Google Scholar

[6] I. Hamberg, C.G. Granqvist, Theoretical model for the optical properties of In2O3: Sn films in the 0.3–50 μm range, Sol. Energy. Mater. 14(1986) 241-256.

DOI: 10.1016/0165-1633(86)90051-1

Google Scholar

[7] D.P. Joseph, P. Renugambal, M. Saravanan, S.P. Raja, C. Venkateswaran, Effect of Li doping on the structural, optical and electrical properties of spray deposited SnO2 thin films, Thin Solid Films 517(2009) 6129-6136.

DOI: 10.1016/j.tsf.2009.04.047

Google Scholar