Deposition and Characterization of Boron-Doped HFCVD Diamond Films on Ti, SiC, Si and Ta Substrates

Abstract:

In the present investigation, titanium (Ti), silicon carbide (SiC), silicon (Si) and tantalum (Ta) samples with the same geometry are selected as substrates to deposite HFCVD boron-doped diamond films with the same deposition parameters, using trimethyl borate as the dopant. FESEM, EDS, Raman spectroscopy and Rockwell hardness tester are used to characterize as-deposited boron-doped diamond (BDD) films. The FESEM micrographs exhibit that the film deposited on Si substrate presents the best uniformity and that on Ti substrate has smallest grain size and film thickness, with titanium element detected in the EDS spectra. Moreover, it’s speculated by indentation test that the adhesive strength between the BDD films and different substrates can be order as SiC>Ta>Ti for the different thermal expansion coefficient gaps between the substrate and diamond, and the hardness of the BDD coated samples measured using Rockwell hardness tester can also be order as SiC>Ta>Ti due to the different hardness of substrate materials. Finally, similar and representative characterization for BDD films is obtained from the Raman spectra for all the BDD films on different substrates.

• Periodical: Applied Mechanics and Materials (Volumes 217-219)
• Pages: 1062-1067
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.217-219.1062
• Online since: November 2012
• Authors: Xin Chang Wang, Bin Shen, Fang Hong Sun
• Keywords: Boron-Doped , Characterization, Diamond Films, HFCVD, Substrate

References

[1] X.L. Peng and T.W. Clyne, Formation and adhesion of hot filament CVD diamond films on titanium substrates, Thin Solid Films, 293 (1997) 261-269

DOI: 10.1016/s0040-6090(96)09116-x

[2] N.A. Braga, C.A.A. Cairo, E.C. Almeida and et al, Temperature influence on the interlayer and surface morphology of diamond coating on 3D porous titanium substrates, Diamond Relat. Mater., 18 (2009) 1065-1069

DOI: 10.1016/j.diamond.2009.01.043

[3] G. Cabral, J. Gäbler, J. Lindner and et al, A study of diamond film deposition on WC–Co inserts for graphite machining: Effectiveness of SiC interlayers prepared by HFCVD, Diamond Relat. Mater., 17 (2008) 1008-1014

DOI: 10.1016/j.diamond.2008.03.017

[4] Y. Liao, F. Ye, Q.Y. Shao and et al, Study of diamond film growth mechanism on porous silicon during hot-filament chemical vapor deposition, Thin Solid Films, 368 (2000) 211-215

DOI: 10.1016/s0040-6090(00)00767-7

[5] L. Xu, W. Wang, M. Wang and et al, Electrochemical degradation of tridecane dicarboxylic acid wastewater with tantalum-based diamond film electrode, Desalination, 222 (2008) 388-393

DOI: 10.1016/j.desal.2007.01.136

[6] P. Wurzinger, P. Pongratz, P. Hartmann and et al, Investigation of the boron incorporation in polycrystalline CVD diamond films by TEM, EELS and Raman spectroscopy, Diamond Relat. Mater., 6 (1997) 763-768

DOI: 10.1016/s0925-9635(96)00668-1

[7] Y. Show, M.A. Witek, P. Sonthalia and et al, Characterization and electrochemical responsiveness of boron-doped nanocrystalline diamond thin-film electrodes, Chem. Mater., 15 (2003) 879-888

DOI: 10.1021/cm020927t

[8] J. Liang, C. Gao, L. Zhang and et al, Studies on distribution of element contents in transient layer at interface between boron-doped diamond film electrode and tantalum substrate, Appl. Surf. Sci., 257 (2011) 6063-6067

DOI: 10.1016/j.apsusc.2011.01.129

[9] Q. Liang, A. Stanishevsky and Y.K. Vohra, Tribological properties of undoped and boron-doped nanocrystalline diamond films, Thin Solid Films, 517 (2008) 800-804

DOI: 10.1016/j.tsf.2008.08.171

[10] F.H. Sun, Y.P. Ma, B. Shen and et al, Fabrication and application of nano–microcrystalline composite diamond films on the interior hole surfaces of Co cemented tungsten carbide substrates, Diamond Relat. Mater., 18 (2009) 7

DOI: 10.1016/j.diamond.2008.10.064

[11] T. Zhang, J.G. Zhang, B. Shen and et al, Simulation of temperature and gas density field distribution in diamond films growth on silicon wafer by hot filament CVD, J. Cryst. Growth, 343 (2012) 55-61

DOI: 10.1016/j.jcrysgro.2012.01.005

[12] B. Shen and F.H. Sun, Effect of surface morphology on the frictional behaviour of hot filament chemical vapour deposition diamond films, Proc. IMechE, 223 (2009) 1-11

[13] J. Qi, C.Y. Chan, I. Bello and et al, Film thickness effects on mechanical and tribological properties of nitrogenated diamond-like carbon films, Surf. Coat. Technol., 145 (2001) 38-43

DOI: 10.1016/s0257-8972(01)01312-3

[14] E. Gheeraert, P. Gonon and A. Deneuville, Effect of boron incorporation on the "quality" of MPCVD diamond films, Diamond Relat. Mater., 2 (1993) 742-746

DOI: 10.1016/0925-9635(93)90215-n

[15] Y.G. Wang, S.P. Lau, B.K. Tay and et al, Resonant Raman scattering studies of Fano-type interference in boron doped diamond, J. Appl. Phys., 92 (2002) 7253-7256

DOI: 10.1063/1.1524018