The Simulation Application for the Structure Design of the Etcher Nozzle

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Abstract:

With the higher and higher etching rate, the flow field situation of the plasma etching chamber became an important factor to design the etcher chamber structure. This paper studied the etcher nozzle structure in detail by using the flow simulation technology to analyze how to get uniform follow field on the surface of the etching wafer, and then this paper determined the structure parameters of the etcher nozzle.

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372-377

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December 2012

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© 2013 Trans Tech Publications Ltd. All Rights Reserved

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