Synthesis and Morphology of ZnO Films Prepared by Magnetron Sputtering

Shiuh Chuan Her; Tsung Chi Chi

doi:10.4028/www.scientific.net/AMM.307.333

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 307Synthesis and Morphology of ZnO Films Prepared by...

Synthesis and Morphology of ZnO Films Prepared by Magnetron Sputtering

Abstract:

Zinc oxide (ZnO) thin films were deposited on glass substrate by Radio frequency (RF) magnetron sputtering. The effect of substrate temperature on the microstructure of the ZnO films has been investigated. Crystal structure and surface morphology of the films were examined by X-ray diffraction (XRD) and atomic force microscopy (AFM). XRD patterns and AFM images show that the crystallinity and grain size are increasing with the increase of substrate temperature.

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Applied Mechanics and Materials (Volume 307)

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333-336

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.307.333

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Online since:

February 2013

Authors:

Shiuh Chuan Her, Tsung Chi Chi

Keywords:

Grain Size, Magnetron Sputtering, Morpholoy, ZnO Film

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