Surface Energy and Crystallite Size Comparisons by Applying Direct Current and Pulse Direct Current on Substrate Bias in PVD Process

H. Hanizam; Md Nizam Abd Rahman; Noraiham Mohamad; A.R. Soufhwee

doi:10.4028/www.scientific.net/AMM.315.98

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 315Surface Energy and Crystallite Size Comparisons by...

Surface Energy and Crystallite Size Comparisons by Applying Direct Current and Pulse Direct Current on Substrate Bias in PVD Process

Abstract:

Surface morphology homogeneity and energy modifications for in situ PVD process are two critical factors to prevent unexpected adhesion failure during machining or service. Unlike during film depositing, there is still much gap to be explored on applying pulsed biasing concepts to the substrate during in situ, to ensure the substrate surface readiness prior to film coating. The purpose of this paper is to study the effects of conventional direct current (DC) and pulse direct current (PDC) applied at substrate bias to the surface energy and crystallite size. Tungsten carbide (WC) cutting tool insert and titanium nitride (TiN) were used as substrate and hard coating respectively. The runs were conducted to compare the bias at DC (-500V) and PDC (-200V, -500V, -800V). The surface energy and crystallite size were characterized through wettability test and X-ray diffraction (XRD) analysis. The applying of PDC on the substrate bias was found to further enhance the characteristics of the surface compared to the conventional DC substrate bias.

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Periodical:

Applied Mechanics and Materials (Volume 315)

Pages:

98-102

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.315.98

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Online since:

April 2013

Authors:

H. Hanizam, Md Nizam Abd Rahman, Noraiham Mohamad, A.R. Soufhwee

Keywords:

Crystallite Size, In Situ Cleaning, PDC Bias, PVD, Surface Energy

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